118 FIB-CVD法で作製したDLCマイクロ構造体とSi基板間の界面微細構造(材料の超精密加工とマイクロ/ナノ加工の動向)

概要

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Diamond-like carbon (DLC) film was deposited on Si(100) substrate by a focused ion-beam chemical vapor deposition (FIB-CVD) method to investigate microstructure of a DLC/Si interface. The microstructure was analyzed by high-resolution transmission electron microscopy (HRTEM) equipped with energy dispersion microscopy (EDS). Bright field images showed that a transition layer existed at the DLC/Si interface. From EDS analysis, it was found that the transition layer consisted of both C and Si atoms, and has a thickness of around 100nm. HRTEM images and convergence beam electron diffraction patterns revealed that the transition layer was structurally divided three layers, i.e. amorphous, clustered and crystalline Si-C layers.
社団法人日本機械学会の論文
2007-11-16