Fabrication of Low Line Edge Roughness Mold by Spin On Glass (SOG) Replica Method
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概要
- 論文の詳細を見る
This paper reports on the fabrication of a low line edge roughness (LER) mold by the spin on glass (SOG) replica method. The fabrication technique provides a transparent mold with a low LER. In the mold fabrication, the combination of a low LER Si master mold made by anisotropic wet etching and the SOG replica process is effective in reducing fluctuation of the transparent mold pattern. Using this method, we could obtain an LER of SOG replica mold as low as 0.80 nm. When this SOG replica mold was used for photo-nanoimprint, the LER of the patterns on the photocurable polymer, used for the process, was found to be 0.86 nm which is considered quite comparable to the LER of the patterns on the Si master mold. Moreover, using the SOG replica mold, we also nanoimprinted a 60 nm line and space (L/S) pattern with an aspect ratio of 2 and 30 nm L/S patterns.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-15
著者
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Taniguchi Jun
Department Of Applied Electronics Tokyo University Of Science
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Miyamoto Iwao
Department Of Applied Electronics Tokyo University Of Science
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HIROSHIMA Hiroshi
MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Scie
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KOMURO Masanori
Oita Industrial Research Institute
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Yamazaki Naoto
Department Of Applied Electronics Tokyo University Of Science
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Kurashima Yuichi
MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Hiroshima Hiroshi
MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Taniguchi Jun
Department of Applied Electronics, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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