Line Width Reproducibility of Photo-Nanoimprints
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-30
著者
-
Hiroshima H
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
-
KURASHIMA Yuichi
MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Scie
-
HIROSHIMA Hiroshi
MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Scie
-
KOMURO Masanori
Oita Industrial Research Institute
関連論文
- Close Observation of the Geometrical Features of an Ultranarrow Silicon Nanowire Device
- Fabrication of 40-150 nm Gate Length Ultrathin n-MOSFETs Using Epitaxial Layer Transfer SOI Wafers
- Fabrication of 40-150nm Gate Length Ultrathin n-MOSFETs Using ELTRAN SOI Wafers
- SiO_2/c-Si Bilayer Electron-Beam Resist Process for Nano-Fabrication
- SiO_2/Poly-Si Multilayered Electron Beam Resist Process for Fabrication of Ultrasmall Tunnel Junctions
- Room Temperature Nanoimprint Technology Using Hydrogen Silsequjoxane (HSQ)
- Fabrication of Low Line Edge Roughness Mold by Spin On Glass (SOG) Replica Method
- Fabrication of Low Line Edge Roughness Mold for Photo-Nanoimprint
- Focused Ga Ion Beam Etching of Si in Chlorine Gas : Etching and Deposition Technology
- Focused Ga Ion Beam Etching of Si in Chlorine Gas
- Evaluation of UV-nanoimprinted surface roughness using Si mold with atomically flat terraces
- Measurement of Adhesive Force Between Mold and Photocurable Resin in Imprint Technology
- Line Width Reproducibility of Photo-Nanoimprints
- Reducing Photocurable Polymer Pattern Shrinkage and Roughness during Dry Etching in Photo-Nanoimprint Lithography
- Step-and-Repeat Photo-Nanoimprint System Using Active Orientation Head
- Evaluation of Line Edge Roughness in Nanoimprint Lithography Using Photocurable Polymer
- Elimination of Pattern Defects of Nanoimprint under Atmospheric Conditions
- Improvement of Imprinted Pattern Uniformity Using Sapphire Mold
- Uniformity in Patterns Imprinted Using Photo-Curable Liquid Polymer
- Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
- Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography
- Electron Beam Assisted Chemical Etching of Single-Crystal Diamond Substrates with Hydrogen Gas
- Step-and-Repeat Photo-Nanoimprint System Using Active Orientation Head
- Characteristics of SiO_2 as a High-Resolution Electron Beam Resist
- Fabrication of Low Line Edge Roughness Mold for Photo-Nanoimprint
- Fabrication of Low Line Edge Roughness Mold by Spin On Glass (SOG) Replica Method
- Line Width Reproducibility of Photo-Nanoimprints