Elimination of Pattern Defects of Nanoimprint under Atmospheric Conditions
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-30
著者
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Hiroshima H
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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HIROSHIMA Hiroshi
MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Scie
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KOMURO Masanori
MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Scie
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KASAHARA Nobuyuki
School of Fundamental Engineering, Tokyo University of Science
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KURASHIMA Yuichi
School of Fundamental Engineering, Tokyo University of Science
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TANIGUCHI Jun
School of Fundamental Engineering, Tokyo University of Science
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- SiO_2/Poly-Si Multilayered Electron Beam Resist Process for Fabrication of Ultrasmall Tunnel Junctions
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- Fabrication of Low Line Edge Roughness Mold for Photo-Nanoimprint
- Focused Ga Ion Beam Etching of Si in Chlorine Gas : Etching and Deposition Technology
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- Evaluation of UV-nanoimprinted surface roughness using Si mold with atomically flat terraces
- Measurement of Adhesive Force Between Mold and Photocurable Resin in Imprint Technology
- Line Width Reproducibility of Photo-Nanoimprints
- Reducing Photocurable Polymer Pattern Shrinkage and Roughness during Dry Etching in Photo-Nanoimprint Lithography
- Step-and-Repeat Photo-Nanoimprint System Using Active Orientation Head
- Evaluation of Line Edge Roughness in Nanoimprint Lithography Using Photocurable Polymer
- Elimination of Pattern Defects of Nanoimprint under Atmospheric Conditions
- Improvement of Imprinted Pattern Uniformity Using Sapphire Mold
- Uniformity in Patterns Imprinted Using Photo-Curable Liquid Polymer
- Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
- Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography
- Electron Beam Assisted Chemical Etching of Single-Crystal Diamond Substrates with Hydrogen Gas
- Step-and-Repeat Photo-Nanoimprint System Using Active Orientation Head
- Characteristics of SiO_2 as a High-Resolution Electron Beam Resist
- Fabrication of Low Line Edge Roughness Mold for Photo-Nanoimprint
- Fabrication of Low Line Edge Roughness Mold by Spin On Glass (SOG) Replica Method
- Line Width Reproducibility of Photo-Nanoimprints
- Elimination of Pattern Defects of Nanoimprint under Atmospheric Conditions