Step-and-Repeat Photo-Nanoimprint System Using Active Orientation Head

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An active orientation head was designed and installed into a step-and-repeat photo-nanoimprint system. The characteristics of the passive part of the active orientation head and compliant contact function as a basic function were evaluated. Feedback control of the active orientation head resulted in 50% load deviation at four locations to within 10%. In addition, asymmetrical load control was realized, which is one of the additional functions of the active orientation head. The automatic photo-nanoimprint sequence was demonstrated, in which the imprint load was controlled to within 1.3% of the target value. In 50 min operation, 25 dies were imprinted on a 4-inch wafer. Bright spots are visible to the eye in the dark-field illumination at each location where patterns should be found. Similar patterns 100–300 nm wide on different dies were observable by optical microscopy. Scanning electron microscope revealed smooth patterns with a half pitch of 100 nm fabricated by the step-and-repeat photo-nanoimprint system.
2004-06-15