Evaluation of Line Edge Roughness in Nanoimprint Lithography Using Photocurable Polymer
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概要
- 論文の詳細を見る
To evaluate the ultimate accuracy in nanoimprint replication using photocurable resin, we studied the line edge roughness (LER) of replicated patterns using a mold pattern on a Si (110) substrate produced by anisotropic wet etching. The root mean square (RMS) for the replicated pattern LER was between 0.64 nm and 0.9 nm. This was slightly larger than that for the mold pattern. The RMS for the mold pattern was between 0.48 nm and 0.62 nm. The replicated pattern RMS shows no systematic change when the ultraviolet light exposure dose is increased from 10 mJ/cm2 to 3 J/cm2. Based on the dependence of the RMS for both of the line edge and Ti coated resin surface, we concluded that the increment of the RMS in the replicated pattern is due to the Ti coating which was carried out for scanning electron microscope observation of the replicated pattern.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-15
著者
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Komuro Masanori
MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Kurashima Yuichi
MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Hiroshima Hiroshi
MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Taniguchi Jun
Depertment of Applied Electronics, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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Miyamoto Iwao
Depertment of Applied Electronics, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
関連論文
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- Fabrication of Low Line Edge Roughness Mold by Spin On Glass (SOG) Replica Method
- Line Width Reproducibility of Photo-Nanoimprints
- Evaluation of Line Edge Roughness in Nanoimprint Lithography Using Photocurable Polymer
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