In-situ Evaluation of Air/Oxygen Percentage Variation by Introducing 1,1,1,3,3-Pentafluoropropane in Ultraviolet Nanoimprint Lithography
スポンサーリンク
概要
- 論文の詳細を見る
In UV nanoimprinting, the air percentage is critical to the generation of bubble defects in nanoimprinted samples. In this work, it is found that as the pentafluoropropane gas (CHF2CH2CF3; 1,1,1,3,3-pentafluoropropane, HFC-245fa, CAS No. 460-3-1) is introduced, the air percentage rapidly decreases from 100% to a stable low level of 8%. By comparison with the bubble shrinking results of real nanoimprinting experiments, it is found that the critical value for obtaining a bubble-free UV nanoimprinting was 3.3% in the oxygen concentration or 15.8% in air percentage.
- 2012-11-25
著者
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SUZUKI Kenta
National Astronomical Observatory of Japan
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HIROSHIMA Hiroshi
National Institute of Advanced Industrial Science and Technology
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Youn Sung-Won
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
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Wang Qing
National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan
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