Effects of Environmental Gas in UV Nanoimprint on the Characteristics of UV-Curable Resin
スポンサーリンク
概要
- 論文の詳細を見る
In this study we investigated the effects of ambient gas on the characteristics of UV-curable resin in UV nanoimprint process by comparing the pattern transfer fidelity and residual layer thicknesses of the samples carried out in air and pentafluoropropane gas. We found that the resin pattern shrinkage induced by UV exposure was markedly affected by the ambient gas environment. The pattern shrinkage reached 22% in pentafluoropropane, while it reached only 3% in air. Also, the effects of pentafluoropropane on residual layer thickness were investigated. It was found that the residual layer using pentafluoropropane was much thinner than could be expected from the shrinkage induced by pentafluoropropane alone. We believe that the thinning of the residual layer is caused not only by shrinkage, but also by a decrease in the viscosity of UV-curable resin.
- 2010-06-25
著者
-
HIROSHIMA Hiroshi
National Institute of Advanced Industrial Science and Technology
-
Wang Qing
National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan
関連論文
- Close Observation of the Geometrical Features of an Ultranarrow Silicon Nanowire Device
- UV Nanoimprint in Pentafluoropropane at a Minimal Imprint Pressure
- Fabrication processes for capacity-equalized mold with fine patterns (Special issue: Microprocesses and nanotechnology)
- Simulation of Resist Filling Properties under Condensable Gas Ambient in Ultraviolet Nanoimprint Lithography (Special Issue : Microprocesses and Nanotechnology)
- Effective Linewidth Measurement of 45-nm-Half-Pitch Ultraviolet Nanoimprint Lithography Patterns by Scanning Electron Microscope Inspection and Extremely Shallow Si Etching (Special Issue : Microprocesses and Nanotechnology)
- Effects of Environmental Gas in UV Nanoimprint on the Characteristics of UV-Curable Resin
- Evaluation of Viscosity Characteristics of Spin-Coated UV Nanoimprint Resin
- Fabrication of Capacity-Equalized Mold for Homogenizing Residual Layer Thickness in Imprint Lithography
- Quick Cavity Filling in UV Nanoimprint Using Pentafluoropropane
- Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient
- Study on Quartz Multitier Mold Fabrication Using Gray Scale Laser Beam Lithography
- In-situ Evaluation of Air/Oxygen Percentage Variation by Introducing 1,1,1,3,3-Pentafluoropropane in Ultraviolet Nanoimprint Lithography
- Study on Change in UV Nanoimprint Pattern by Altering Shrinkage of UV Curable Resin
- Effects of Granularity of Complementary Patterns in a Capacity-Equalized Mold Used for UV Nanoimprint Lithography
- Fabrication of Ultrasmooth Mirrors by UV-Nanoimprint
- Evaluation of UV-Nanoimprinted Surface Roughness Using Si Mold with Atomically Flat Terraces
- Uniform Residual Layer Creation in Ultraviolet Nanoimprint Using Spin Coat Films for Sub-100-nm Patterns with Various Pattern Densities
- Control of Resin Filling and Pattern Quality of Ultraviolet Nanoimprint Lithography in Pentafluoropropane and Helium Ambient
- Study of Demolding Characteristics in Step-and-Repeat Ultraviolet Nanoimprinting
- Uniform Residual Layer Creation in Ultraviolet Nanoimprint Using Spin Coat Films for Sub-100-nm Patterns with Various Pattern Densities (Special Issue : Microprocesses and Nanotechnology)
- Control of Bubble Defects in UV Nanoimprint