Control of Resin Filling and Pattern Quality of Ultraviolet Nanoimprint Lithography in Pentafluoropropane and Helium Ambient
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概要
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Quick and bubble-free cavity filling is a crucial issue in ultraviolet nanoimprint lithography (UV-NIL), which is key to mass production by UV-NIL, and this has been accomplished by performing UV-NIL in helium or condensable gas ambient. However, such an ambient has both positive and negative attributes. In this study, the feasibility of UV-NIL in the mixed gas ambient of helium and pentafluoropropane (PFP) as a tool for controlling the combination of characteristics in throughput and pattern quality in a quick and bubble-free patterning process was verified. First, the shrinkage behaviors and elimination time of bubbles were investigated in different ambients (air, helium, and PFP) and compared with each other. Through step-and-repeat UV-NIL experiments using a mold with checker patterns having 100-μm-wide and 94-nm-deep cavities, it was found that bubbles could not be eliminated even after imprinting for 600 s in air ambient, whereas they were removed completely in helium or PFP ambient. Additionally, it was confirmed that UV-NIL in PFP ambient resulted in much faster bubble elimination, lower mold releasing force, larger shrinkage, and higher surface roughness, than UV-NIL in helium ambient. Next, the shrinkage behaviors of bubbles were characterized at different helium fractions in the He/PFP mixture (2000 sccm). In UV-NIL in He/PFP ambient, with the increase in helium fraction, bubble elimination time increased quadratically, and mold releasing force increased, whereas shrinkage and surface roughness decreased rather linearly.
- 2013-06-25
著者
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SUZUKI Kenta
National Astronomical Observatory of Japan
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HIROSHIMA Hiroshi
National Institute of Advanced Industrial Science and Technology
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Youn Sung-Won
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
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Wang Qing
National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan
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Wang Qing
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
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Hiroshima Hiroshi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
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