Youn Sung-Won | National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
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概要
- Youn Sung-Wonの詳細を見る
- 同名の論文著者
- National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japanの論文著者
関連著者
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HIROSHIMA Hiroshi
National Institute of Advanced Industrial Science and Technology
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Youn Sung-Won
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
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Wang Qing
National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan
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SUZUKI Kenta
National Astronomical Observatory of Japan
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Nishioka Yasushiro
Department Of Physics Faculty Of Science University Of Tokyo
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Suzuki Kenta
Department Of Animal Sciences Teikyo University Of Science And Technology
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Nishioka Yasushiro
College Of Science And Technology Nihon University
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Hiroshima Hiroshi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
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Suzuki Kenta
College of Science and Technology, Nihon University, Funabashi, Chiba 274-8501, Japan
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Wang Qing
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
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Park Sang-Cheon
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
著作論文
- Fabrication processes for capacity-equalized mold with fine patterns (Special issue: Microprocesses and nanotechnology)
- Effective Linewidth Measurement of 45-nm-Half-Pitch Ultraviolet Nanoimprint Lithography Patterns by Scanning Electron Microscope Inspection and Extremely Shallow Si Etching (Special Issue : Microprocesses and Nanotechnology)
- Study on Quartz Multitier Mold Fabrication Using Gray Scale Laser Beam Lithography
- In-situ Evaluation of Air/Oxygen Percentage Variation by Introducing 1,1,1,3,3-Pentafluoropropane in Ultraviolet Nanoimprint Lithography
- Effects of Granularity of Complementary Patterns in a Capacity-Equalized Mold Used for UV Nanoimprint Lithography
- Uniform Residual Layer Creation in Ultraviolet Nanoimprint Using Spin Coat Films for Sub-100-nm Patterns with Various Pattern Densities
- Control of Resin Filling and Pattern Quality of Ultraviolet Nanoimprint Lithography in Pentafluoropropane and Helium Ambient
- Uniform Residual Layer Creation in Ultraviolet Nanoimprint Using Spin Coat Films for Sub-100-nm Patterns with Various Pattern Densities (Special Issue : Microprocesses and Nanotechnology)