Uniform Residual Layer Creation in Ultraviolet Nanoimprint Using Spin Coat Films for Sub-100-nm Patterns with Various Pattern Densities (Special Issue : Microprocesses and Nanotechnology)
スポンサーリンク
概要
著者
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HIROSHIMA Hiroshi
National Institute of Advanced Industrial Science and Technology
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Nishioka Yasushiro
College Of Science And Technology Nihon University
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Youn Sung-Won
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
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Wang Qing
National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan
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Suzuki Kenta
College of Science and Technology, Nihon University, Funabashi, Chiba 274-8501, Japan
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