Impact of Spherical Aberrations on Printing Characteristics of Irregularly Aligned Patterns of Alternating Phase Shift Mask

概要

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The printing characteristics of irregularly aligned patterns with alternating phase shift masks (PSMs) and the impact of spherical aberration on these characteristics are investigated by experiments and calculations of optical images. In experiments, very poor printing characteristics are observed for particular irregularly aligned patterns, even if there is no phase contradiction in the layout of the patterns. These patterns show small depth of focus (DOF) and/or poor mask fidelity. The phenomena are analyzed by beam configurations in interference and calculated optical images. For some patterns, the defocus characteristics are essentially poor even in non-aberrated optics. For some other patterns, the spherical aberration degrades the characteristics significantly, while non-aberrated characteristics are not so poor. In the application of alternating PSMs for device pattern formation, it is important to consider the pattern layout and lens aberration.
社団法人応用物理学会の論文
1999-04-15