Fujino Takeshi | Ulsi Laboratory Mitsubishi Electric Corporation

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著作論文

Comparison of Standard and Low-Dose Separation-by-Implanted-Oxygen Substrates for 0.15 μm SOI MOSFET Applications
Comparison of Standard and Low-Dose SIMOX Substrates for 0.15μm SOI MOSFET Applications
A 0.18 ★m 32 Mb Embedded DRAM Macro for 3-D Graphics Controller
Isolation and Characterization of UDP-glucosyltransferase in the Cultured Cells of Nicotiana tabacum
Distereoselective Formation of Disaccharides from(RS)-1- Phenylethanol by Cultured Cells of Catharanthus roseus
Electron Beam Direct Writing Techniques for the Development of Sub-Quarter-Micron Devices
Proximity Effect Correction for 1:1 X-Ray Mask Fabrication
Application of Proximity Effect Correction Usirng Pattern-Area Density to Patterning on a Heavy-Metal Substrate and the Cell-Projection Exposure
Visualization of cell wall architecture of Oocystis apiculata by using of rapid-freezing and deep etching techniques

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