Hirao T | Advanced Device Development Dept. Renesas Technology Corp.
スポンサーリンク
概要
関連著者
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Hirao T
Advanced Device Development Dept. Renesas Technology Corp.
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INOUE Yasuo
ULSI Development Center, Mitsubishi Electric Corporation
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HIRAO Tadashi
ULSI Laboratory, Mitsubishi Electric Corporation
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Yamaguchi Y
Kumamoto Techno Res. Park Kumamoto Jpn
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YAMAGUCHI Yasuo
ULSI Laboratory, Mitsubishi Electric Corporation
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Inoue Y
National Defense Acad. Yokosuka Jpn
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Maegawa Shigeto
Advanced Device Development Dept. Renesas Technology Corp.
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Inoue Yasuo
Ulsi Development Center Mitsubishi Electric Corporation
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Yamaguchi Y
Tohoku Univ. Sendai
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MAEGAWA Shigeto
ULSI Laboratory, Mitsubishi Electric Corporation
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IWAMATSU Toshiaki
Advanced Device Development Dept., Renesas Technology Corp.
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Yamaguchi Y
Central Workshop Osaka University
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Maegawa Shigeto
Ulsi Development Center Mitsubishi Electric Corporation
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Ipposhi Takashi
Advanced Device Development Dept. Renesas Technology Corp.
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Iwamatsu Toshiaki
Advanced Device Development Dept. Renesas Technology Corp.
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Ipposhi T
Advanced Device Development Dept. Renesas Technology Corp.
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YAMAGUCHI Yasuo
Institute for Materials Research, Tohoku University
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IWAMATSU Toshiaki
ULSI Laboratory, Mitsubishi Electric Corporation
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IPPOSHI Takashi
ULSI Development Center, Mitsubishi Electric Corporation
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IPPOSHI Takashi
Advanced Device Development Dept., Renesas Technology Corp.
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Inoue Y
Ntt Access Network Service Systems Laboratories Ntt Corporation
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NISHIMURA Tadashi
ULSI Laboratory, Mitsubishi Electric Corporation
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UEDA Kimio
System LSI Development Center, Mitsubishi Electric Corporation
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MAEDA Shigenobu
ULSI Development Center, Mitsubishi Electric Corporation
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MASHIKO Koichiro
System LSI Development Center, Mitsubishi Electric Corporation
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JOACHIM Hans-Oliver
ULSI Laboratory, Mitsubishi Electric Corporation
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FUJINO Takeshi
ULSI Laboratory, Mitsubishi Electric Corporation
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KATO Takaaki
ULSI Laboratory, Mitsubishi Electric Corporation
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Horino Y
Advanced Device Development Dept. Renesas Technology Corp.
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INUISHI Masahide
Advanced Device Development Dept., Renesas Technology Corp.
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KURIYAMA Hirotada
ULSI Laboratory, Mitsubishi Electric Corporation
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KOHNO Yoshio
ULSI Laboratory, Mitsubishi Electric Corporation
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Joachim Hans-oliver
Ulsi Laboratory Mitsubishi Electric Corporation
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Kohno Yoshio
Ulsi Laboratory Mitsubishi Electric Corporation
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Nakayama Kazuhiko
Mechanical Processing Technology Research Laboratories Kao Corporation
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Horiba Yasutaka
System Lsi Laboratory Mitsubishi Electric Corporation
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Maeda Shigenobu
Ulsi Development Center Mitsubishi Electric Corporation
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Nishimura Tadashi
The Ulsi Development Center Mitsubishi Electric Corporation
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Nishimura Tadashi
Ulsi Research And Development Center Mitsubishi Electric Corporation
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Kuriyama Hiroyuki
Sanyo Electric Co. Ltd.:giant Electronics Technology Co. Ltd.
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Fujino T
Inst. Molecular Sci. (ims) Okazaki
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Fujino Takeshi
Ulsi Laboratory Mitsubishi Electric Corporation
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Ueda K
Ntt Atsugi‐shi Jpn
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Nakayama K
National Inst. Advanced Industrial Technol. And Sci. Ibaraki Jpn
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Kato Takaaki
Ulsi Laboratory Mitsubishi Electric Corporation
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Inuishi Masahide
Advanced Device Development Dept. Renesas Technology Corp.
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Nishimura Tadashi
Ulsi Development Center Mitsubishi Electric Corporation
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NAKAYAMA Kouichi
Research Center for Materials Science at Extreme Conditions, Osaka University
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TAKAOKA Hiromichi
Research Center for Materials Science at Extreme Conditions, Osaka University
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TAKAI Mikio
Research Center for Materials Science at Extreme Conditions, Osaka University
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INUISHI Masahide
ULSI Laboratory, Mitsubishi Electric Corporation
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KINOMURA Atsushi
ONRI, AIST
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HORINO Yuji
ONRI, AIST
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YASUOKA Akihiko
ULSI Laboratory, Mitsubishi Electric Corporation
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MIYOSHI Hirokazu
ULSI Laboratory, Mitsubishi Electric Corporation
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KOMATSU Futoshi
Renesas Semiconductor Engineering Corp.
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HIRANO Yuuichi
Advanced Device Development Dept., Renesas Technology Corp.
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TAKASHINO Hiroyuki
Advanced Device Development Dept., Renesas Technology Corp.
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MAEGAWA Shigeto
Advanced Device Development Dept., Renesas Technology Corp.
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OHJI Yuzuru
Advanced Device Development Dept., Renesas Technology Corp.
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Ueda K
Mitsubishi Electric Corp. Itami‐shi Jpn
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Ueda Kimio
System Lsi Development Center Mitsubishi Electric Corp.
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HORIBA Yasutaka
The authors are with Kita-Itami Works, Mitsubishi Electric Corporation
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Takai M
Research Center For Materials Science At Extreme Conditions And Graduate School Of Engineering Scien
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KINOMURA Atsushi
National Institute of Advanced Industrial Science and Technology
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Ueda K
System Lsi Laboratory Mitsubishi Electric Corporation
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HIRANO Yoichi
National Institute of Advanced Industrial Science and Technology (AIST)
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Yasuoka Akihiko
Ulsi Laboratory Mitsubishi Electric Corporation
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Horiba Yasutaka
Lsi Laboratory Mitsubishi Electric Corporation
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Horiba Yasutaka
The Authors Are With Kita-itami Works Mitsubishi Electric Corporation
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Miyoshi Hirokazu
Ulsi Laboratory Mitsubishi Electric Corporation
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Mashiko Koichiro
The Ulsi Development Center Mitsubishi Electric Corporation
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Mashiko Koichiro
System Lsi Development Center Mitsubishi Electric Corporation
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Mashiko Koichiro
System Lsi Laboratory Mitsubishi Electric Corporation
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Ohji Yuzuru
Advanced Device Development Dept. Renesas Technology Corp.
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Hirano Y
Advanced Device Development Dept. Renesas Technology Corp.
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Ueda Katsuhiko
Department Of Information Engineering Nara National College Of Technology
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Miyoshi Hirokazu
徳島大学医学部
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Inuishi Masahide
Ulsi Development Center Mitsubishi Electric Corporation
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Kinomura A
National Institute Of Advanced Industrial Science And Technology
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Takai Mikio
Research Center For Environmental Genomics Kobe University
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Takaoka H
The Functional Devices Research Laboratories Nec Corporation
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Takai Mikio
Faculty Of Engineering Science And Reseatch Center For Extreme Materials
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Ipposhi Takashi
Advanced Device Development Department, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Ohji Yuzuru
Advanced Device Development Department, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Hirano Yuuichi
Advanced Device Development Department, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Iwamatsu Toshiaki
Advanced Device Development Department, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Inuishi Masahide
Advanced Device Development Department, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
著作論文
- Direct Measurement of Transient Drain Currents in Partially-Depleted SOI N-Channel MOSFETs Using a Nuclear Microprobe for Highly Reliable Device Designs
- Analysis of the Delay Distributions of 0.5μm SOI LSIs (Special Issue on SOI Devices and Their Process Technologies)
- Comparison of Standard and Low-Dose Separation-by-Implanted-Oxygen Substrates for 0.15 μm SOI MOSFET Applications
- High-Speed SOI 1/8 Frequency Divider Using Field-Shield Body-Fixed Structure
- Comparison of Standard and Low-Dose SIMOX Substrates for 0.15μm SOI MOSFET Applications
- Suppression of Self-Heating in Hybrid Trench Isolated SOI MOSFETs with Poly-Si plug and W plug
- Impact of μA-ON-Current Gate-All-Around TFT (GAT) for Static RAM of 16Mb and beyond
- Impact of μ A-ON-Current Gate All-Around TFT (GAT) for 16MSRAM and Beyond
- Direct Measurement of Transient Drain Currents in Partially-depleted SOI NMOSFETs Using a Nuclear Microprobe for Highly Reliable Device Designs