Hirano Y | Advanced Device Development Dept. Renesas Technology Corp.

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概要

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著作論文

Analyses of the Radiation-Caused Characteristics Change in SOI MOSFETs Using Field Shield Isolation
Suppression of Self-Heating in Hybrid Trench Isolated SOI MOSFETs with Poly-Si plug and W plug
High-Dose Implantation of MeV Carbon Ion into Silicon
Au^+-Ion-Implanted Silica Glass with Non-Linear Optical Property
Microbeam Line of MeV Heavy Ions for Materials Modification and In-Situ Analysis : Beam-Induced Physics and Chemistry
Microbeam Line of MeV Heavy Ions for Materials Modification and In-Situ Analysis
Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
Focused High-Energy Heavy Ion Beams
Ion-Beam 3C-SiC Heteroepitaxy on Si
Neutron Activation Analysis of Ultrahigh-Purity Ti-Al Alloys in Comparison with Glow-Discharge Mass Spectrometry
Epitaxial Growth of Pure ^Si Thin Films Using Isotopically Purified Ion Beams : Semiconductors
Neutron Activation Analysis of High-Purity Iron in Comparison with Chemical Analysis
Silicon Carbide Film Growth Using Dual Isotopical ^Si^- and ^C^+ Ion species
Formation of High Purity films by Negative Ion Beam Sputtering Using an Ultra-high Vacuum Self-Sputtering Method
Formation of Ultra High Pure Metal Thin Films by Means of a Dry Process
Macroparticle-Free Ti-Al Films by Newly Developed Coaxial Vacuum Arc Deposition
Formation of Crystalline SiC Buried Layer by High-Dose Implantation of MeV Carbon Ions at High Temperature
Operating Conditions to Achieve High Performance in PPCD in a Reversed-Field Pinch Plasma
Operating Conditions to Achieve High Performance in PPCD in a Reversed-Field Pinch Plasma
Impact of Body Bias Controlling in Partially Depleted SOI Devices with Hybrid Trench Isolation Technology
A 90nm-node SOI Technology for RF Applications
Effect of Pressure on Mode Transition Point of Reversed Field Pinch Plasma in Partially Relaxed States
The First Plasma Rotation Measurement in a Large Reversed-Field Pinch Device,TPE-RX : Fluids, Plasmas, and Electric Discharges
Deuterium Ice Pellet Injection during Pulsed Poloidal Current Drive Operation in Toroidal Pinch Experiment-RX Reversed-Field Pinch Device
Observations of High Ion Temperatures in a Reversed Field Pinch Plasma
Bolometric Measurement of Reversed Field Pinch Plasma in TPE-1R (M)
Partially Relaxed Minimum Energy States of Reversed-Field-Pinch Plasma
Effects of Impurities and Neutrals on Setting-Up Phase of Reversed Field Pinch
A Realistic Approach to Improve the Shell Proximity of an RFP Device
Partially Relaxed States of Plasmas in Two Different Types of Devices
Control of the Locked Mode in a Reversed-Field Pinch Plasma Using a Rotating Toroidal Field
Figure of Merit for the Improvement of Confinement in Pulsed Poloidal Current Drive Experiments in Reversed-Field Pinch Devices
Measurement of Vacuum Vessel Current and its Relation to Locked Mode in a Reversed-field Pinch Device, TPE-RX(Nuclear Science, Plasmas, and Electric Discharges)
Confinement Improvement in a Single Helical State of' the Reversed Field Pinch Plasma on TPE-1RM20 : Fluids, Plasmas, and Electric Discharges
Plasma and Mode Rotations in a Reversed-Field Pinch Device, TPE-1RM20
Outline of a Large Reversed Field Pinch Machine,TPE-RX
Measurement of Fast Electron Velocity Distribution Function in a Reversed Field Pinch Plasma

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