Kang H | Samsung Electronics Suwon Kor

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概要

• 同名の論文著者
• Samsung Electronics Suwon Korの論文著者

関連著者

• Kang Hee

  Department Of Applied Physics Osaka University:department Of Physics Sciences Chungbuk National Univ

• Kang H

  Samsung Electronics Suwon Kor

• Shimizu R

  Osaka Univ. Osaka Jpn

• Shimizu Ryuichi

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Shimizu Ryuichi

  Department Of Applied Physics Faculty Engineering Osaka University

• Kang Hee

  Department Of Dermatology Ajou University School Of Medicine

• SHIMIZU Ryuichi

  Department of Applied Physics, Osaka University

• KAWATOH Eizou

  Department of Engineering, Osaka University

• Kawatoh E

  Osaka Univ. Osaka

• KAWATOH Eizoh

  Department of Applied Physics, Osaka University

• Kawatoh Eizoh

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Kimura Yoshihide

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Satoh Minoru

  Nagaoka University Of Technology

• Horino Y

  Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)

• Satoh M

  Tohoku Univ. Sendai Jpn

• CHAYAHARA Akiyoshi

  Government Industrial Research Institute

• KIUCHI Masato

  Government Industrial Research Institute

• HORINO Yuji

  Government Industrial Research Institute

• FUJII Kanenaga

  Government Industrial Research Institute

• SATOU Mamoru

  Government Industrial Research Institute

• BEAG Young

  Department of Applied Physics, Osaka University

• KIMURA Yoshihide

  Department of Applied Physics, Osaka University

• HORINO Yuji

  National Institute of Advanced Industrial Science and Technology

• Chayahara Akiyoshi

  Department Of Electrical Engineering Hiroshima University

• Beag Y

  Department Of Applied Physics Graduate School Of Engineering Osaka University

• Beag Young

  Department Of Applied Physics Osaka University

• Hirano Y

  Advanced Device Development Dept. Renesas Technology Corp.

• Satou Mamoru

  Goverment Industrial Research Institute

• Kiuchi M

  National Inst. Advanced Industrial Sci. And Technol. Osaka Jpn

• Horino Yuji

  National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpn

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著作論文

• Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
• Monte Carlo Simulation Approach to Sputtering in Multi-Component Targets
• Approximation Formula of Cross-section for the Universal Potential Expression Proposed by Ziegler et al.
• Computer Simulation Analysis of the Planar Channeling Effect in Practical Ion Implantation : Semiconductors and Semiconductor Devices

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