Shimizu Ryuichi | Department Of Applied Physics Faculty Engineering Osaka University
スポンサーリンク
概要
関連著者
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SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
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Souda R
National Institute For Research In Inorganic Materials
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Takai Yoshizo
Department Of Applied Physics Faculty Of Engineering Osaka University
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Takai Yoshiaki
Nagoya University
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KIMURA Yoshihide
Department of Applied Physics, Osaka University
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TAKAI Yoshizo
Department of Material and Life Sciences, Graduate School of Engineering, Osaka University
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高井 義造
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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木村 吉秀
阪大院・工
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木村 吉秀
大阪大 大学院工学研究科
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Inoue Masahiko
Department Of Neurology Showa University Fujigaoka Hospital
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Inoue M
Department Of Electrical Engineering Osaka Prefectural Technical College
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Inoue M
Osaka Inst. Technol. Osaka Jpn
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Inoue M
Setsunan Univ. Osaka Jpn
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Inoue Masami
Association Of Super-advanced Electronics Technologies (aset)
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Inoue M
Assoc. Super‐advanced Electronics Technol. (aset) Yokohama Jpn
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Inoue M
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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Inoue M
Kyoto Univ. Kyoto Jpn
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Inoue Masumi
Department Of Quantum Engineering Nagoya University
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Takai Yoshiaki
Depertment Of Electrical Engineering Nagoya University
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Inoue Masataka
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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Inoue M
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Murata Kenji
Department Of Animal Science University Of California
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生田 孝
大阪電通大
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生田 孝
大阪歯科大学 口腔解剖
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Ikuta Takashi
Department Of Applied Physics Faculty Engineering Osaka University
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BEAG Young
Department of Applied Physics, Osaka University
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Beag Young
Department Of Applied Physics Osaka University
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Min K‐y
Department Of Applied Physics Osaka University
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Ikuta Takashi
Department Of Applied Physics Osaka University
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Kang Hee
Department Of Applied Physics Osaka University:department Of Physics Sciences Chungbuk National Univ
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MITSUHASHI Riichirou
Department of Applied Physics, Faculty of Engineering, Osaka University
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MIN Kyung-Youl
Department of Applied Physics, Faculty of Engineering, Osaka University
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Beag Y
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Kang Hee
Department Of Dermatology Ajou University School Of Medicine
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Kimura Y
Ntt Access Network Systems Laboratories Optical Soliton Transmission Research Group
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Ueda Kazuyuki
Department Of Applied Physics Faculty Of Engineering Osaka University
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KIUCHI Masato
Government Industrial Research Institute
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HASHIMOTO Hatsujiro
Department of Physics, Kyoto Technical University
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KAWASAKI Tadahiro
Department of Material and Life Sciences, Graduate School of Engineering, Osaka University
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TARUTANI Masayoshi
Department of Applied Physics, Faculty of Engineering, Osaka University
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Kang H
Samsung Electronics Suwon Kor
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Kiuchi M
National Inst. Advanced Industrial Sci. And Technol. Osaka Jpn
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Namba S
Inst. Physical And Chemical Research Wako
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Namba Susumu
Nagasaki Institute Of Applied Science
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MURATA Kenji
Department of Applied Physics, Faculty Engineering, Osaka University
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LEE Hyung-Ik
Department of Applied Physics, Faculty of Engineering, Osaka University
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FUJII Kanenaga
Government Industrial Research Institute
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YAMAZAKI Yasunori
Department of Applied Physics,Faculty of Engineering,Osaka University
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NAGATOMI Takaharu
Department of Material and Life Science, Graduate School of Engineering, Osaka University
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YURUGI Toshikazu
Horiba Ltd.
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IKUTA Takashi
Osaka Electro-Communication University
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ZHOU Guofu
Department of Applied Physics, Osaka University
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Namba Susumu
Frontier Research Program Riken
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OGAI Keiko
Department of Applied Physics, Faculty of Engineering, Osaka University
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OGAI Keiko
Toyota Technological Institute
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KAWANO Takashi
Department of Applied Physics, Faculty of Engineering, Osaka University
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Zhou G
Department Of Applied Physics Osaka University
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Ogai Keiko
Department Of Applied Physics Osaka University
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Lee Hyung-ik
Department Of Applied Physics Faculty Of Engineering Osaka University
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Satoh Minoru
Nagaoka University Of Technology
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Kang Suk
Department of Materials Science and Engineering, Seoul National University
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Fukumi K
National Inst. Advanced Industrial Sci. And Technol. Jpn
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Satoh M
Tohoku Univ. Sendai Jpn
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Aoyagi Y
Semiconductor Laboratory Riken The Institute For Physical And Chemical Research
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Lee H‐i
Department Of Applied Physics Faculty Of Engineering Osaka University
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Lee S
Photonics Research Center Korea Institute Of Science And Technology
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Lee Seok
Division Of Hematolgoy Catholic Hematopoietic Stem Cell Transplantation Center College Of Medicine T
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Kang Suk
Department Of Applied Physics Faculty Of Engineering Osaka University
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Hofmann S
National Res. Inst. Metals Ibaraki Jpn
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Namba S
Japan Atomic Energy Res. Inst. Kyoto Jpn
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Namba S
Osaka Univ. Osaka
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Kitano T
Tokyo Electron Kyushu Ltd. Kumamoto Jpn
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Ishibashi Koji
Department Of Applied Physics And Dimes Delft University Of Technology:the Institute Of Physical And
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Kondo A
Osaka Prefecture Univ. Osaka Jpn
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Kondo Akio
Department Of Applied Physics Faculty Of Engineering Osaka University
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AOYAGI Yoshinobu
Frontier Research Program, The Institute of Physical and Chemical Research (RIKEN)
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Aoyagi Y
Riren (the Institute Of Physical And Chemical Research)
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HOFMANN Siegfried
Department of Applied Physics, Faculty of Engineering, Osaka University
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MITSUHASHI Riichiro
Department of Applied Physics, Faculty of Engineering, Osaka University
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Kawano T
Osaka Univ. Osaka Jpn
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Lee Sang
Micro-electronics Technical Laboratory Etri
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SATOU Mamoru
Government Industrial Research Institute
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Kawai Shichio
Nationl Institute For Researches In Inorganic Materials
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NAMBA Susumu
Frontire Research Program
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HIROSAWA Satoshi
Sumitomo Special Metals Company Ltd.
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Fujii Kentaro
Department Of Mechano-aerospace Engineering Tokyo Institute Of Technology
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Aoyagi Y
The Institute Of Physical And Chemical Research
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Nonoyama Shinji
Quantum Material Research Laboratory Frontier Research Program The Institute Of Physical And Chemica
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Kawano T
Tokyo Electron Kyushu Ltd. Kumamoto Jpn
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OBORI Ken-ichi
Horiba Ltd.
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NAGATOMI Takaharu
Depatment of Material and Life Science. Graduate School of Engineering, Osaka University
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KIMURA Yoshihide
Depatment of Material and Life Science. Graduate School of Engineering, Osaka University
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UTSURO Hidetoshi
Department of Applied Physics, Faculty of Engineering, Osaka University
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ICHIHASHI Mikio
Instrument Division, Hitachi Ltd
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SATOU Yuji
Instrument Division, Hitachi Ltd
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Namba Susumu
Research Center For Extreme Materials And Department Of Electrical Engineering Osaka University
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ISHIBASHI Kouji
Frontier Research Program, RIKEN
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Kitano T
Fundamental Research Laboratories Nec Corporation
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Hofmann Siegfried
Department Of Applied Physics Faculty Of Engineering Osaka University:(present Address) Max-planck-i
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Hirosawa Satoshi
Sumitomo Special Metals Co. Ltd.
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Hirosawa Satoshi
Research And Development Division Neomax Company Limited
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Lee Seok
Photonics Research Center Korea Institute Of Science And Technology
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Aoyagi Yoshinobu
Frontier Research Program Riken
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Aoyagi Yoshinobu
The Institute Of Physical And Chemical Research (riken):microelectronics R & D Center Chinese Ac
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Saeki Noboru
Department Of Applied Physics Faculty Of Engineering Osaka University
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Hirosawa S
Sumitomo Special Metals Co. Ltd.
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IROKAWA Yoshihiro
Department of Applied Physics, Faculty of Engineering, Osaka University
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LEE Suchan
Department of Applied Physics, Faculty of Engineering, Osaka University
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KAWATOH Eizou
Department of Engineering, Osaka University
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Utsuro Hidetoshi
Department Of Applied Physics Faculty Of Engineering Osaka University
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Satou Yuji
Instrument Division Hitachi Ltd
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Goto Keisuke
Department Of Applied Physics Osaka University:nagoya Institute Of Technology
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Akita Tomoki
Department Of Applied Physics Faculty Of Engineering Osaka University
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Satou Mamoru
Goverment Industrial Research Institute
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Kawatoh E
Osaka Univ. Osaka
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Yoshikawa Hiroaki
Department Of Electrical Engineering Osaka University
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YOSHIKAWA Hideki
Department of Orthopaedic Surgery, Osaka University Graduate School of Medicine
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藤井 研一
阪大院理
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Otani S
National Inst. Res. In Inorganic Materials Ibaraki Jpn
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Ando Toshiyuki
Department of Cardiology, Saitama Medical Center
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Otani S
National Inst. Res. Inorganic Materials Ibaraki
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Otani S
National Inst. Materials Sci. Jpn
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Otani Shigeki
National Institute For Materials Science Advanced Materials Laboratory
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Inoue Mitsuteru
Department Of Electrical & Electronic Engineering. Toyohashi University Of Technology
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Horino Y
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Ando Toshiyuki
Department Of Applied Physics Faculty Of Engineering Osaka University
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ISHIZAWA Yoshio
National Institute for Research in Inorganic Materials
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TOMITA MASATO
Department of Orthopedic Surgery, Graduate School of Biomedicine, Nagasaki University
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Fujii K
Osaka Univ. Osaka
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Ueda Tomohiko
Department Of Applied Physics Faculty Of Engineering Osaka University
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Tomita M
Ntt Sci. And Core Technol. Lab. Tokyo Jpn
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Aono Masakazu
National Institute For Research In Inorganic Materials
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Takeguchi Masaki
High Voltage Electron Microscopy Station National Institute For Materials Science
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KINOSHITA Masaharu
Manufacturing Engineering Laboratory, Tokyo Shibaura Electric Co., Ltd.
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MURAYAMA Tomokazu
Manufacturing Engineering Laboratory, Tokyo Shibaura Electric Co., Ltd.
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NISHIZAWA Hisao
Japan Electron Optics Laboratory Co., Ltd.
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YAMAMOTO Toshiyuki
Japan Electron Optics Laboratory Co., Ltd.
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NISHIGORI Nobuko
Department of Applied Physics, Faculty Engineering, Osaka University
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FUJITA Junji
Institute of Plasma Physics, Nagoya University
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TANAKA Takaho
National Institute of Research in Inorganic Mateerials
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Koshikawa Takanori
Fundamental Electronics Research Institute Academic Frontier Promotion Center Osaka Electro-communic
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Koshikawa Takanori
Department Of Applied Physics Osaka University
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MATSUI Shinji
Fundamental Res. Labs., NEC Corporation
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KAJIWARA Kazuo
Sony Corporation
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Kataoka Yoshiyuki
Department of Cardiologyese Red Cross Nagoya First Hospital
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CHAYAHARA Akiyoshi
Government Industrial Research Institute
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HORINO Yuji
Government Industrial Research Institute
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Kataoka Yoshiyuki
Department Of Applied Physics Osaka University
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Gamo Kenji
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Kawai Shichio
National Institute For Researches In Inorganic Materials
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Kawai Shichio
National Institute For Research In Inorganic Materials
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HORINO Yuji
National Institute of Advanced Industrial Science and Technology
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FUJII Kentaro
Department of Mechano-Aerospace Engineering, Tokyo Institute of Technology
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Fujii Kentarou
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Ishizawa Yoshio
National Institute For Research In Inorganec Materials
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Ishizawa Yoshio
Institute Of Geoscience The University Of Tsukuba
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Isizawa Yoshio
National Institute For Research In Inorganic Materials
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Ishizawa Yoshio
National Institute For Research Inorganic Materials
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MAEDA Yasushi
NTT Basic Research Laboratories
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Otani S
National Inst. Materials Sci. Ibaraki Jpn
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Otani Shigeki
National Institute For Materials Science
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NISHIKATA Kentarou
Department of Material and Life Science, Graduate School of Engineering, Osaka University
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TAKAI Yoshizo
Depatment of Material and Life Science. Graduate School of Engineering, Osaka University
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SATO Yuji
Instrument Division, Hitachi Ltd
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ISAKOZAWA Shigehito
Instrument Division, Hitachi Ltd
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ISAKOZAWA Shigeto
Instrument Division, Hitachi Ltd
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AKITA Tomoki
Department of Applied Physics, Faculty of Engineering Osaka University
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NAGATA Takanori
Department of Applied Physics, Faculty of Engineering Osaka University
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Kato Mikio
Department of Pediatric Dentistry, Osaka Dental University
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KUMURA Yoshihide
Department of Applied Physics, Faculty of Engineering, Osaka University
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OBA Noriko
Department of Applied Physics, Faculty of Engineering, Osaka University
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Souma Makoto
Analytical Technology R&d Laboratory Matsushita Electric Works Limited
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SOUDA Ryutaro
National Institute for Research in Inorganic Materials
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HOU Yinchun
National Institute for Research in Inorganic Materials
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OSHIMA Chuhei
National Institute for Research in Inorganic Materials
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MATSUDA Kyoji
Department of Applied Physics, Osaka University
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Kang Hee
Department Of Physics Chungbuk National University
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Ding Ze-jun
Department Of Astronomy And Applied Physics University Of Science And Technology Of China
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Kinoshita Masaharu
Manufacturing Engineering Laboratory Tokyo Shibaura Electric Co. Ltd.
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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Fujita Junji
Institute Of Plasma Physics Nagoya University
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Matsushima Tomoaki
Advanced Technology Research Laboratory Matsushita Electric Works Ltd.
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Matsushima Tomoaki
Advanced Technology Research Laboratory Matsushita Electric Works Limited
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Saeki Noboru
Department Of Applied Physics Osaka University
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TAKEI Koji
NTT Basic Research Laboratories
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SUZUKI Yosuke
Department of Applied Physics, Osaka University
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HOHMANN Siegfried
Department of Applied Physics, Osaka University
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Yoshikawa H
Gunma Univ. Gunma Jpn
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Li Chun
Department Of Applied Physics Faculty Of Engineering Osaka University
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Ichimura Shingo
Department Of Applied Physics Osaka University
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Kato Mikio
Department Of Mathematics Faculty Of Engineering Kyushu Institute Of Technology
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Oba Noriko
Department Of Applied Physics Faculty Of Engineering Osaka University
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Hirano Y
Advanced Device Development Dept. Renesas Technology Corp.
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Goto Keisuke
Department Of Orthopaedic Surgery Miyazaki Medical College
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Akita Tomoki
Special Division For Green Life Technology National Institute Of Advanced Industrial Science And Tec
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Miura Kouji
Department Of Physics Aichi University Of Education
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Tomita Masato
Department Of Applied Physics Osaka University
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Tamura Hifumi
Central Research Laboratory Hitachi Ltd.
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Oshima Chuhei
Department Of Applied Physics Waseda University:presto Structure And Function Properties Jrdc
著作論文
- High Contrast Observation of Magnetic Domain with High Voltage SEM
- Calculation of X-Ray Production in Alloy Targets by New Approach Using Monte Carlo Method
- Anisotropic Emission of Secondary Electrons from Fe(110) Single Crystal
- Monte Carlo Simulation for Auger Depth Profiling of GaAs/AlAs Superlattice Structure by Ar^+ Ion Sputtering
- Auger Depth Profiles of a GaAs/AlAs Superlattice Structure Obtained with O^+_2 and Ar^+ Ion Sputtering
- Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
- Titanium Nitride Crystal Growth with Preferred Orientation by Dynamic Mixing Method
- Electron Impact Spectra of Mercury in Intermediate Energies
- Spin-Polarization and Differential Cross Section of Electron-Mercury Inelastic Scattering
- Fourier analysis of HRTEM image deterioration caused by mechanical vibration
- Nano-area electron diffraction pattern reconstructed from three-dimensional Fourier spectrum
- Real-time observation of spherical aberration-free phase image using high-speed image processing CCD video camera
- Monte Carlo Simulation of Generations of Continuous and Characteristic X-Rays by Electron Impact
- Optimization of voltage axis alignment in high-resolution electron microscopy
- Development of a real-time defocus-image modulation processing electron microscope. II. Dynamic observation of spherical aberration-free phase image of surface atoms
- Development of a real-time defocus image modulation processing electron microscope. I. Construction
- TEM Study of the Interface Structure of CVD Diamond Heteroepitaxilly Grown on Pt(111) Substrate
- Preliminary experiments for development of real-time defocus-image modulation processing electron microscope
- Cross-Sectional Transmission Electron Microscope Observation of Isolated Diamond Particles Heteroepitaxially Grown on Pt(111) Substrate
- Observation of Al surface during sputter-cleaning and annealing procedures under UHV-REM
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography : Micro/nanofabrication and Devices
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography
- Extraction of Spherical and Chromatic Aberration -free Information by Focal-depth Extension Processing Under Tilted Illumination
- Interaction Potential between He^+ and Ti in a keV Range as Revealed by a Specialized Technique in Ion Scattering Spectroscopy
- Surface Structure of Zr-O/W(100) System at 1700 K
- Anomaly in Sputtering on Titanium Nitride Film Growth by Post-Irradiation Processing
- Work Function Change Measured by Electron Beam Chopping Technique as Applied to Oxygen-Adsorbed W(100) at High Temperature
- Ion-Assisted Crystal Growth by Post Irradiation as Applied to Nitride Formatiorn
- Study on Zr-Si/W(100) Surface at High Temperatures by Reflection High Energy Electron Diffraction
- Study on Zr-Si/W(100) Surface at High Temperatures by Combined Surface Analysis Techniques
- Monte Carlo Simulation Approach to Sputtering in Multi-Component Targets
- Approximation Formula of Cross-section for the Universal Potential Expression Proposed by Ziegler et al.
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization. : III. Change of the Velocity Distribution with Time after Sputtering
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization. : II. A Quantitative Composition Analysis of Cu-Al Alloy
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization : I. Development of Laser Ion Counting System with a Simple Time-of-Flight Measurement
- Reflection of keV Light Particles from Random Solidsby Modified Single-Collision Model
- A New Bessel-Box Energy Analyzer for Sputtered Neutral Mass Spectrometry
- An Application of Square Wave Modulation Technique to Scanning Auger Electron Microscopy
- Formation of "bcc Boundary Phase" in Transmission Electron Microscopy Samples of Nd-Fe-B Sintered Magnets
- Coercivity and Grain Boundary Morphology in Nd-Fe-B Sintered Magnets
- Auger Study of Preferential Sputtering for Cu-Ni Alloy Sample
- Distortion of Elastically Scattered Electron Energy Spectrum in a Retarding Field Type Spectrometer
- Photoelectric Work Function Study on Iron (100) Surface Combined with Auger Electron Spectroscopy
- Continuum X-Ray Generation from W Film on Cu Substrate
- Sputtering of Si with keV Ar^+ Ions : II.Computer Simulation of Sputter Broadening Due to Ion Bombardment in Depth Profiling
- Sputtering of Si with keV Ar^+ Ions. : I. Measurement and Monte Carlo Calculations of Sputtering Yield
- Calculation of Electron Spin Polarization for Polarization Detector
- Accumulation Effect of Bombarding N^+_2 Ions in Al for Crystal Growth of AlN Film
- Study of Accumulation Effect of Bombarding N^+_2 Ions on Al Surface by Auger Electron Spectroscopy
- New Neutral- and Ion-Scattering Spectroscopy as Applied to Selective Adsorption of Hydrogen on Cu-Pt Alloy Surfaces
- Study on the Resolution of the Backscattered Electron Image by the Monte Carlo Method
- Monte Carlo Calculations on Electron Scattering in a Solid Target
- A New Type Edge Effect in High Resolution Scanning Electron Microscopy
- Stability of Beam Current of Single Crystal LaB_6 Cathode in High Vacuum
- Field Emission Pattern of LaB_6-Single Crystal Tip
- Cross-Sectional Transmission Electron Microscopic Observation of Etch Hillocks and Etch Pits in LiTaO_3 Single Crystal
- Basic Study of Quantitative Ion Scattering Spectroscopy I Correction Factors for Quantification
- Surface and Interface Study of Titanium Nitride on Si Substrate Produced by Dynamic Ion Beam Mixing Method
- Reflectioru High Energy Electron Diffraction Observation of Dynamic Ion Beam Mixing Process in Titanium Nitride Crystal Growth
- Light and Secondary Ion Emissions from Ion Bombarded Solid Surfaces
- The Effect of Ejection Angle in Ion-Beam Sputter Deposition of Superconducting Amorphous Beryllium Film
- Construction of Retarding Field Cylindrical Mirror Analyzer
- Anomaly in Sputtering of Aluminum under N^+_2 Ion Bombardment
- Weibull Distribution of X-Ray Pulse-Height
- An Approach for Nanolithography Using Electron Holography
- Nanoprobe cathodoluminescence scanning electron microscope as aplied to synthesized diamond
- Characterization of Sc-O/W(100) Surface as Schottky Emitter : Work Function Change for Activation Processing
- Observation of Reconstructed Pt(100) Surface by Reflection Electron Microscopy
- Computer Simulation Analysis of the Planar Channeling Effect in Practical Ion Implantation : Semiconductors and Semiconductor Devices
- Cross-sectional High-Resolution Transmission Electron Microscope Study of Heteroepitaxial Diamond Film Grown on Pt Substrate
- Ion Beam Assisted Deposition of Metal Organic Films Using Focused Ion Beams
- Application of the Focused-Ion-Beam Technique for Preparing the Cross-Sectional Sample of Chemical Vapor Deposition Diamond Thin Film for High-Resolution Transmission Electron Microscope Observation
- Development of coincidence transmission electron microscope (II) Observation of coincidence electron microscopic image
- Development of Coincidence Transmission Electron Microscope (I) Coincidence Image Construction System
- Initial Stage of Preferential Sputtering in Cu-Pt Alloy Studied by Sputtered Neutrals Mass Spectrometry
- Energy Distributions of Atoms Sputtered from Cu-Pt Alloy Measured by Nonresonarut Multiphoton Ionization Sputtered Neutrals Mass Spectrometry
- Monte Carlo Simulation of Secondary Electron Emission from Tungsten Surfaces with Various Work Functions as Applied to Sc/W Surfaces
- Measurement of the Energy Distributions of Secondary Ions from Pure Metals and Alloys
- A Hybrid Monte Carlo Calculation Estimate of Angular Distribution of Sputtered Atoms for keV Proton Bombardment
- An Ion Beam Apparatus in the Range of keV-Energies
- Ion Induced Auger Electron Emission from Al-Mg Alloy under Low Energy Argon Ion Bombardment
- Monte Carlo Simulation of Multiple Inelastic Scatterings in Crystals
- New Computer Simulation Software of Electron Trajectories for Evaluation of Magnetic Field Immersion-Type Field Emission Gun
- Depth Distribution of Characteristic X-rays in EPMA Alloy Targets : I. Angular Distribution and f(x)-Curves of Fe K X-rays in Fe-Al Alloy Targets
- Secondary Electron Emission from Aluminum by Argon and Oxygen Ion Bombardment below 3 keV
- Fundamental Studies on Quantitative Analysis in Ion Probe Microanalyzer
- Experimental Studies of Secondary Electron Emission of TiO2 and Ti
- Comparison of Energy-Loss Functions from Reflection Electron Energy-Loss Spectroscopy Spectra with Surface and Bulk Energy-Loss Functions: in Case of Cu
- Secondary Electron Measurement with Auger Electron Microprobe. : I. Calibration of the CMA in the Low-Energy Region
- Angular Distributions of Sputtered Particles Ejected from Pure Cu, Pt and Cu -Pt Alloy under 3 keV Ar^+ Ton Bombardment
- Surface Analyzer Combining Secondary Ion Mass Spectrometry and Ion Scattering Spectrometry(速報)
- The f(χ)-Curves for FeKα and AlKα X-Rays in the Inclined EPMA Targets of Fe, Al and Fe-Al Alloy
- Monte Carlo Simulation of Generations of Continuous and Characteristic X-Rays by Electron Impact
- Characterization of a refractory surface at a high temperature applied to the Zr-O/W(100) system. On self-recovery function
- A Simple Calculation on Backscattering of Light Ions of KeV Energies
- Investigation of Energy Dissipation of Electrons in Al- and Cu-Targets by Monte Carlo Method
- Monte Carlo Simulations on Scattering of Bombarded Ions in Solids
- Quantitative Analysis by Auger Electron Spectroscopy