BEAG Young | Department of Applied Physics, Osaka University
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概要
関連著者
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SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
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BEAG Young
Department of Applied Physics, Osaka University
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Beag Young
Department Of Applied Physics Osaka University
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Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
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Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
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Beag Y
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Shimizu R
Osaka Univ. Osaka Jpn
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Souda R
National Institute For Research In Inorganic Materials
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Shimizu R
Department Of Information Science Osaka Institute Of Technology
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Shimizu Ryuichi
Department of Information Processing, Osaka Institute of Technology
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KIUCHI Masato
Government Industrial Research Institute
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Kiuchi M
National Inst. Advanced Industrial Sci. And Technol. Osaka Jpn
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Min K‐y
Department Of Applied Physics Osaka University
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FUJII Kanenaga
Government Industrial Research Institute
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MITSUHASHI Riichirou
Department of Applied Physics, Faculty of Engineering, Osaka University
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MIN Kyung-Youl
Department of Applied Physics, Faculty of Engineering, Osaka University
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Min Kyung-youl
Department Of Applied Physics Osaka University
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Mitsuhashi R
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Mitsuhashi Riichirou
Department Of Applied Physics Faculty Of Engineering Osaka University
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Satoh Minoru
Nagaoka University Of Technology
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Inoue M
Department Of Electrical Engineering Osaka Prefectural Technical College
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Inoue M
Osaka Inst. Technol. Osaka Jpn
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Inoue M
Setsunan Univ. Osaka Jpn
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Horino Y
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Satoh M
Tohoku Univ. Sendai Jpn
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Kang Hee
Department Of Dermatology Ajou University School Of Medicine
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Inoue Masami
Association Of Super-advanced Electronics Technologies (aset)
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Inoue Masahiko
Department Of Neurology Showa University Fujigaoka Hospital
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Inoue M
Assoc. Super‐advanced Electronics Technol. (aset) Yokohama Jpn
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Inoue M
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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Inoue M
Kyoto Univ. Kyoto Jpn
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Inoue Masumi
Department Of Quantum Engineering Nagoya University
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CHAYAHARA Akiyoshi
Government Industrial Research Institute
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HORINO Yuji
Government Industrial Research Institute
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SATOU Mamoru
Government Industrial Research Institute
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KIMURA Yoshihide
Department of Applied Physics, Osaka University
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HORINO Yuji
National Institute of Advanced Industrial Science and Technology
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Inoue Masataka
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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MAEDA Yasushi
NTT Basic Research Laboratories
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Inoue M
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Kang Hee
Department Of Applied Physics Osaka University:department Of Physics Sciences Chungbuk National Univ
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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TAKEI Koji
NTT Basic Research Laboratories
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TARUTANI Masayoshi
Department of Applied Physics, Faculty of Engineering, Osaka University
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Kang H
Samsung Electronics Suwon Kor
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Hirano Y
Advanced Device Development Dept. Renesas Technology Corp.
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Satou Mamoru
Goverment Industrial Research Institute
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MIZUHARA Yuzuru
Department of Applied Physics, Graduate School of Engineering, Osaka University
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Horino Yuji
National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpn
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Kimura Yoshihide
Department Of Applied Physics Faculty Of Engineering Osaka University
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Tarutani Masayoshi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Mizuhara Yuzuru
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Inoue Masahiko
Department Of Applied Physics Faculty Of Engineering Osaka University
著作論文
- Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
- Accumulation Effect of Bombarding N^+_2 Ions in Al for Crystal Growth of AlN Film
- Study of Accumulation Effect of Bombarding N^+_2 Ions on Al Surface by Auger Electron Spectroscopy
- Surface and Interface Study of Titanium Nitride on Si Substrate Produced by Dynamic Ion Beam Mixing Method
- Reflectioru High Energy Electron Diffraction Observation of Dynamic Ion Beam Mixing Process in Titanium Nitride Crystal Growth
- The Effect of Ejection Angle in Ion-Beam Sputter Deposition of Superconducting Amorphous Beryllium Film