HORINO Yuji | Government Industrial Research Institute
スポンサーリンク
概要
関連著者
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Horino Y
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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CHAYAHARA Akiyoshi
Government Industrial Research Institute
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HORINO Yuji
Government Industrial Research Institute
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HORINO Yuji
National Institute of Advanced Industrial Science and Technology
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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Hirano Y
Advanced Device Development Dept. Renesas Technology Corp.
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Horino Yuji
National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpn
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Satoh Minoru
Nagaoka University Of Technology
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Satoh M
Tohoku Univ. Sendai Jpn
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KIUCHI Masato
Government Industrial Research Institute
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FUJII Kanenaga
Government Industrial Research Institute
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Kiuchi M
National Inst. Advanced Industrial Sci. And Technol. Osaka Jpn
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SATOU Mamoru
Government Industrial Research Institute
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Horiba Yasutaka
System Lsi Laboratory Mitsubishi Electric Corporation
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Satou Mamoru
Goverment Industrial Research Institute
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TAKAI Mikio
Faculty of Engineering Science, and Research Center for Extreme Materials, Osaka University
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SATOH Mamoru
Government Industrial Research Institute Osaka
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CHAYAHARA Akiyoshi
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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Chayahara Akiyoshi
Government Industrial Research Institute Osaka
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Takai Mikio
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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Fukumi K
National Inst. Advanced Industrial Sci. And Technol. Jpn
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Fukumi Kohei
Government Industrial Research Institute Osaka
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Kang Hee
Department Of Dermatology Ajou University School Of Medicine
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Satoh Masaharu
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
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Kadono Kohei
Government Industrial Research Institute Osaka
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Sakaguchi Toru
Government Industrial Research Institute Osaka
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Miya Masaru
Government Industrial Research Institute Osaka
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Hayakawa Junji
Government Industrial Research Institute Osaka
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BEAG Young
Department of Applied Physics, Osaka University
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KIMURA Yoshihide
Department of Applied Physics, Osaka University
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FUJIMOTO Fuminori
Institute of Scientific and Industrial Research, Osaka University
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MOKUNO Yoshiaki
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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KINOMURA Atsushi
National Institute of Advanced Industrial Science and Technology
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KINOMURA Atsushi
Government Industrial Research Institute Osaka
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MOKUNO Yoshiaki
Government Industrial Research Institute Osaka
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Satoh M
Department Of Physics Faculty Of Science Okayama University
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Kang Hee
Department Of Applied Physics Osaka University:department Of Physics Sciences Chungbuk National Univ
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Kang H
Samsung Electronics Suwon Kor
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Beag Y
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Beag Young
Department Of Applied Physics Osaka University
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Kadono K
Osaka National Research Inst. Osaka
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Shimizu R
Osaka Univ. Osaka Jpn
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Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
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Kimura Yoshihide
Department Of Applied Physics Faculty Of Engineering Osaka University
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Kinomura A
National Institute Of Advanced Industrial Science And Technology
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Mokuno Y
Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology
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Fujimoto Fuminori
Institute Of Physics College Of General Education University Of Tokyo
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Fujimoto Fuminori
Institute Of Scientific And Industrial Research Osaka University
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Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
著作論文
- High-Dose Implantation of MeV Carbon Ion into Silicon
- Au^+-Ion-Implanted Silica Glass with Non-Linear Optical Property
- Microbeam Line of MeV Heavy Ions for Materials Modification and In-Situ Analysis : Beam-Induced Physics and Chemistry
- Microbeam Line of MeV Heavy Ions for Materials Modification and In-Situ Analysis
- Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
- Focused High-Energy Heavy Ion Beams
- Formation of Crystalline SiC Buried Layer by High-Dose Implantation of MeV Carbon Ions at High Temperature