Horino Yuji | National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpn
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概要
- HORINO Yujiの詳細を見る
- 同名の論文著者
- National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpnの論文著者
関連著者
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Horino Yuji
National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpn
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Horino Y
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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HORINO Yuji
National Institute of Advanced Industrial Science and Technology
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Horiba Yasutaka
System Lsi Laboratory Mitsubishi Electric Corporation
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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Hirano Y
Advanced Device Development Dept. Renesas Technology Corp.
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CHAYAHARA Akiyoshi
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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KINOMURA Atsushi
National Institute of Advanced Industrial Science and Technology
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Chayahara Akiyoshi
Government Industrial Research Institute Osaka
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Kinomura A
National Institute Of Advanced Industrial Science And Technology
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CHAYAHARA Akiyoshi
Government Industrial Research Institute
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CHAYAHARA Akiyoshi
AIST Kansai
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HORINO Yuji
Government Industrial Research Institute
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Satoh Minoru
Nagaoka University Of Technology
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Satoh M
Tohoku Univ. Sendai Jpn
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KINOMURA Atsushi
Osaka National Research Institute, AIST
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HORINO Yuji
Osaka National Research Institute, AIST
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KIUCHI Masato
Government Industrial Research Institute
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FUJII Kanenaga
Government Industrial Research Institute
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TSUBOUCHI Nobuteru
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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Kiuchi M
National Inst. Advanced Industrial Sci. And Technol. Osaka Jpn
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Tsubouchi Nobuteru
Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology
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Heck Claire
National Institute Of Advanced Industrial Science And Technology Aist Kansai Laboratory Of Purified
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TAKAI Mikio
Faculty of Engineering Science, and Research Center for Extreme Materials, Osaka University
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SATOU Mamoru
Government Industrial Research Institute
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Satou Mamoru
Goverment Industrial Research Institute
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Takai Mikio
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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ABIKO Kenji
Institute for Materials Research, Tohoku University
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CHAYAHARA Akiyoshi
National Institute of Advanced Industrial Science and Technology
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MOKUNO Yoshiaki
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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TSUBOUCHI Nobuteru
Osaka National Research Institute
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CHAYAHARA Akiyoshi
Osaka National Research Institute
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HECK Claire
Osaka National Research Institute
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Abiko Kenji
Institute For Materials Research Tohoku University
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Mokuno Y
Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology
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HAYASHI Yoshihiko
Research Reactor Institute, Kyoto University
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Fukumi K
National Inst. Advanced Industrial Sci. And Technol. Jpn
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NISHIMURA Tadashi
ULSI Laboratory, Mitsubishi Electric Corporation
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Chun Sung-yong
Department Of Materials Physics Osaka National Research Institute Aist
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TAKAKI Seiichi
Institute for Materials Research, Tohoku University
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Ohno Y
Nagoya Univ. Naogya Jpn
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Ohno Yoshikazu
Ulsi Laboratory Mitsubishi Electric Corporation
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CHAYAHARA Akiyoshi
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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KISHIMOTO Takehisa
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University
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SONODA Kenichirou
ULSI Laboratory, Mitsubishi Electric Corporation
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FUJII Kanenaga
Osaka National Research Institute, AIST
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SATOH Mamoru
Government Industrial Research Institute Osaka
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KINOMURA Atsushi
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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HORINO Yuji
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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NAKANO Yukihiro
Research Reactor Institute, Kyoto University
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HORINO Yuji
Department of Materials Physics, Osaka National Research Institute
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Nishimura Tadashi
The Ulsi Development Center Mitsubishi Electric Corporation
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Takaki Seiichi
Institute For Materials Research Tohoku University
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Sayama H
Mitsubishi Electric Corp. Hyogo Jpn
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Kishimoto T
Department Of Physics Osaka University
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Kishimoto T
Department Of Electrical Engineering Waseda University
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Horino Yuji
Department Of Crystalline Materials Science Faculty Of Engineering Nagoya University
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Nakano Yukihiro
Research Reactor Institute Kyoto University
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Takaki S
Institute For Materials Research Tohoku University
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Hayashi Y
Research Reactor Institute Kyoto University
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Chayahara Akiyoshi
Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology
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Sonoda K
Ulsi Development Center Mitsubishi Electric Corporation
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Nishimura Tadashi
Ulsi Development Center Mitsubishi Electric Corporation
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Hayashi Yoshihiko
Research Reactor Institute Kyoto University
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藤井 研一
阪大院理
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KITAMURA Naoyuki
National Institute of Advanced Industrial Science and Technology
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FUKUMI Kohei
National Institute of Advanced Industrial Science and Technology
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TAKANO Hiromichi
Department of Physiology, Nagoya City University Medical School
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Fukumi Kohei
National Inst. Of Advanced Industrial Sci. And Technol.
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Fukumi Kohei
Government Industrial Research Institute Osaka
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Park Y‐k
Samsung Electronics Gyeonggi‐do Kor
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Kang Hee
Department Of Dermatology Ajou University School Of Medicine
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Yokota Kazuaki
Department Of Molecular Chemistry Graduate Shool Of Engineering Hokkaido University
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Horino Y
Advanced Device Development Dept. Renesas Technology Corp.
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Fujii K
Osaka Univ. Osaka
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Fujii Ken-ichi
Department Of Physics Graduate School Of Science Osaka University
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Oe Kunishige
Department Of Electronics And Information Science Faculty Of Engineering And Design Kyoto Institute
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Nishida K
Osaka Univ. Osaka Jpn
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Satoh Masaharu
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
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Takai M
Research Center For Materials Science At Extreme Conditions And Graduate School Of Engineering Scien
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YOKOTA Katsuhiro
Faculty of Engineering, Kansai University
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PARK Yang-Keun
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University
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SAYAMA Hirokazu
ULSI Laboratory, Mitsubishi Electric Corporation
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SAYAMA Hirokazu
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University
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Kadono Kohei
Government Industrial Research Institute Osaka
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Sakaguchi Toru
Government Industrial Research Institute Osaka
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Miya Masaru
Government Industrial Research Institute Osaka
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Hayakawa Junji
Government Industrial Research Institute Osaka
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BEAG Young
Department of Applied Physics, Osaka University
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KIMURA Yoshihide
Department of Applied Physics, Osaka University
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FUJIMOTO Fuminori
Institute of Scientific and Industrial Research, Osaka University
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MIRANDA Rosalvo
Centro Universitario FEEVALE
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MIRANDA Marines
Instituto de Fisica, Universidade Federal do Rio Grande do Sul
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KINOMURA Atsushi
Department of Materials Physics, Osaka National Research Institute
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TSUBOUCHI Nobuteru
Department of Materials Physics, Osaka National Research Institute
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HECK Claire
Department of Materials Physics, Osaka National Research Institute
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CHUN Sung-Yong
Osaka National Research Institute
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FUKUI Hirotaka
Adachi New Industrial Co., Ltd.
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KINOMURA Atsushi
Government Industrial Research Institute Osaka
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MOKUNO Yoshiaki
Government Industrial Research Institute Osaka
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Nishida Kouji
Faculty Of Engineering Kansai University
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Satoh M
Department Of Physics Faculty Of Science Okayama University
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NISHI Junji
National Institute of Advanced Industrial Science and Technology
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SODEOKA Satoshi
National Institute of Advanced Industrial Science and Technology, Kansai Center
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YAMANAKA Hiroshi
National Institute of Advanced Industrial Science and Technology, Kansai Center
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Kang Hee
Department Of Applied Physics Osaka University:department Of Physics Sciences Chungbuk National Univ
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TAKEHARA Yuji
Department of Electronics and Information Science, Kyoto Institute of Technology
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Kitamura Naoyuki
National Institute Of Advanced Industrial Science And Technology Kansai Center
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Nishimura Tadashi
Ulsi Research And Development Center Mitsubishi Electric Corporation
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Sodeoka S
National Inst. Advanced Industrial Sci. And Technol. Tsukuba Jpn
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Kang H
Samsung Electronics Suwon Kor
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Beag Y
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Beag Young
Department Of Applied Physics Osaka University
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Hirai K
Kanagawa High-technology Foundation
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Saraie Junji
Department Of Electronic Engineering Faculty Of Engineering Kyoto University
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Kadono K
Osaka National Research Inst. Osaka
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Kumagai M
Kanagawa Industrial Technology Research Institute
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Tamura Susumu
Faculty Of Engineering Kansai University
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Fukui Hirotaka
Adachi New Industrial Co. Ltd.
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Sayama Hirokazu
Ulsi Development Center Mitsubishi Electric Corporation
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Sayama Hirokazu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Kamai Masayoshi
Joining And Welding Research Institute Osaka University
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SATHO Mamoru
Government Industrial Research institute Osaka
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Shimizu R
Osaka Univ. Osaka Jpn
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Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
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YOSHIMOTO Masahiro
Cooperative Research Center, Kyoto Institute of Technology
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HIRAI Kiyohito
Kanagawa High-Technology Foundation, Kanagawa Science Park
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TAKANO Hiromichi
Kanagawa High-Technology Foundation, Kanagawa Science Park
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YUTANI Akira
Faculty of Engineering, Kansai University
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HORINO Yuuji
Government Industrial Research Institute Osaka
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KUMAGAYA Mashao
Kanagawa High-Technology Foundation, Kanagawa Science Park
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Nishi Junji
Optoelectronics Glass Group Photonics Research Institute National Institute Of Advanced Industrial S
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Kimura Yoshihide
Department Of Applied Physics Faculty Of Engineering Osaka University
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Yokota K
Kobe Univ. Kobe Jpn
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Sodeoka Satoshi
National Institute Of Advanced Industrial Science And Technology Kansai Center
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Yokota Katsuhiro
Faculty Of Engineering Kansai University
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Yutani Akira
Faculty Of Engineering Kansai University
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Sakaguchi M
Kansai Univ. Osaka Jpn
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Takano H
Department Of Physiology Nagoya City University Medical School
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Takano Hiromichi
Kanagawa High-technology Foundation
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Fujimoto Fuminori
Institute Of Physics College Of General Education University Of Tokyo
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Fujimoto Fuminori
Institute Of Scientific And Industrial Research Osaka University
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Sakaguchi M
Univ. Tsukuba
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Yamanaka Hiroshi
National Institute Of Advanced Industrial Science And Technology Kansai Center
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Takai Mikio
Faculty Of Engineering Science And Reseatch Center For Extreme Materials
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Tsubouchi Nobuteru
Department Of Material Physics Osaka National Research Institute
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Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
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Chayahara Akiyoshi
National Institute of Advanced Industrial Science and Technology Kansai, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Chayahara Akiyoshi
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
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Baibich Mario
Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, RS, Brazil
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Huang Wei
Laboratory of High-Tech Materials, Institute of Chemistry, The Chinese Academy of Sciences, Zhongguancun North First Street 2, 100080 Beijing, People's Republic of China
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Yoshimoto Masahiro
Cooperative Research Center, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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Horino Yuji
National Institute of Advanced Industrial Science and Technology Kansai, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Horino Yuji
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
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Miranda Marines
Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, RS, Brazil
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Yokota Katsuhiro
Faculty of Engineering and High-Technology Research Center, Kansai University, Suita, Osaka 564-8680, Japan
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Huang Wei
Laboratory of High-Tech Materials, Institute of Chemistry, The Chinese Academy of Sciences, Zhongguancun North First Street 2, 100080 Beijing, People's Republic of China
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NISHIDA Katsuhiko
Central Research Laboratories, Nippon Electric Co., Ltd.
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Takano Hiromichi
Kanagawa High Technology Foundation Kanagawa Science Park
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Heck Claire
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
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Yoshimoto Masahiro
Cooperate Research Center, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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SODEOKA Satoshi
National Institute of Advanced Industrial Science and Technology
著作論文
- Well Structure by High-Energy Boron Implantation for Soft-Error Reduction in Dynamic Random Access Memories (DRAMs)
- Estimation of Carrier Suppression by High-Energy Boron-Implanted Layer for Soft Error Reduction
- High-Dose Implantation of MeV Carbon Ion into Silicon
- Au^+-Ion-Implanted Silica Glass with Non-Linear Optical Property
- Microbeam Line of MeV Heavy Ions for Materials Modification and In-Situ Analysis : Beam-Induced Physics and Chemistry
- Microbeam Line of MeV Heavy Ions for Materials Modification and In-Situ Analysis
- Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
- Focused High-Energy Heavy Ion Beams
- Ion-Beam 3C-SiC Heteroepitaxy on Si
- Neutron Activation Analysis of Ultrahigh-Purity Ti-Al Alloys in Comparison with Glow-Discharge Mass Spectrometry
- Epitaxial Growth of Pure ^Si Thin Films Using Isotopically Purified Ion Beams : Semiconductors
- Neutron Activation Analysis of High-Purity Iron in Comparison with Chemical Analysis
- Silicon Carbide Film Growth Using Dual Isotopical ^Si^- and ^C^+ Ion species
- Formation of High Purity films by Negative Ion Beam Sputtering Using an Ultra-high Vacuum Self-Sputtering Method
- Formation of Ultra High Pure Metal Thin Films by Means of a Dry Process
- Macroparticle-Free Ti-Al Films by Newly Developed Coaxial Vacuum Arc Deposition
- Formation of Crystalline SiC Buried Layer by High-Dose Implantation of MeV Carbon Ions at High Temperature
- Annealing of Se^+-Implanted GaAs Encapsulated with As-Doped a-Si:H
- Chemical State and Refractive Index of Mg-Ion-Implanted Silica Glass
- Metallic Alloy Coatings Using Coaxial Vacuum Arc Deposition
- Lattice Distortion of GaAsBi Alloy Grown on GaAs by Molecular Beam Epitaxy
- Fe Deposition or Implantation into Vacuum Arc Deposited Cr Films