CHAYAHARA Akiyoshi | National Institute of Advanced Industrial Science and Technology
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概要
関連著者
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CHAYAHARA Akiyoshi
National Institute of Advanced Industrial Science and Technology
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HORINO Yuji
National Institute of Advanced Industrial Science and Technology
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Horino Y
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Horino Yuji
National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpn
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MOKUNO Yoshiaki
National Institute of Advanced Industrial Science and Technology
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TSUBOUCHI Nobuteru
National Institute of Advanced Industrial Science and Technology
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MIRANDA Rosalvo
Centro Universitario FEEVALE
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MIRANDA Marines
Instituto de Fisica, Universidade Federal do Rio Grande do Sul
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CHAYAHARA Akiyoshi
AIST Kansai
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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藤井 研一
阪大院理
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KITAMURA Naoyuki
National Institute of Advanced Industrial Science and Technology
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FUKUMI Kohei
National Institute of Advanced Industrial Science and Technology
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Fukumi Kohei
National Inst. Of Advanced Industrial Sci. And Technol.
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Fukumi K
National Inst. Advanced Industrial Sci. And Technol. Jpn
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Horino Y
Advanced Device Development Dept. Renesas Technology Corp.
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Fujii K
Osaka Univ. Osaka
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Fujii Ken-ichi
Department Of Physics Graduate School Of Science Osaka University
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Oe Kunishige
Department Of Electronics And Information Science Faculty Of Engineering And Design Kyoto Institute
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HECK Claire
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purifie
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BAINICH Mario
Instituto de Fisica, Universidade Federal do Rio Grande do Sul
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CHAYAHARA Akiyoshi
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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KINOMURA Atsushi
National Institute of Advanced Industrial Science and Technology
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NISHI Junji
National Institute of Advanced Industrial Science and Technology
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SODEOKA Satoshi
National Institute of Advanced Industrial Science and Technology, Kansai Center
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YAMANAKA Hiroshi
National Institute of Advanced Industrial Science and Technology, Kansai Center
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Horiba Yasutaka
System Lsi Laboratory Mitsubishi Electric Corporation
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TAKEHARA Yuji
Department of Electronics and Information Science, Kyoto Institute of Technology
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Kitamura Naoyuki
National Institute Of Advanced Industrial Science And Technology Kansai Center
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Chayahara Akiyoshi
Government Industrial Research Institute Osaka
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Sodeoka S
National Inst. Advanced Industrial Sci. And Technol. Tsukuba Jpn
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Heck Claire
National Institute Of Advanced Industrial Science And Technology Aist Kansai Laboratory Of Purified
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Saraie Junji
Department Of Electronic Engineering Faculty Of Engineering Kyoto University
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YOSHIMOTO Masahiro
Cooperative Research Center, Kyoto Institute of Technology
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Nishi Junji
Optoelectronics Glass Group Photonics Research Institute National Institute Of Advanced Industrial S
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Sodeoka Satoshi
National Institute Of Advanced Industrial Science And Technology Kansai Center
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Yamanaka Hiroshi
National Institute Of Advanced Industrial Science And Technology Kansai Center
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Chayahara Akiyoshi
National Institute of Advanced Industrial Science and Technology Kansai, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Chayahara Akiyoshi
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
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Baibich Mario
Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, RS, Brazil
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Huang Wei
Laboratory of High-Tech Materials, Institute of Chemistry, The Chinese Academy of Sciences, Zhongguancun North First Street 2, 100080 Beijing, People's Republic of China
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Yoshimoto Masahiro
Cooperative Research Center, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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Horino Yuji
National Institute of Advanced Industrial Science and Technology Kansai, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Horino Yuji
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
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Miranda Marines
Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, RS, Brazil
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Huang Wei
Laboratory of High-Tech Materials, Institute of Chemistry, The Chinese Academy of Sciences, Zhongguancun North First Street 2, 100080 Beijing, People's Republic of China
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Heck Claire
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
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Yoshimoto Masahiro
Cooperate Research Center, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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SODEOKA Satoshi
National Institute of Advanced Industrial Science and Technology
著作論文
- 23-O-16 Hardness of DLC Deposited by Plasma Based Ion Implantation and Deposition Method Using Mixed RF and Negative High Voltage Pulses
- Fe Deposition or Implantation into Vacuum Arc Deposited Cr Films
- Chemical State and Refractive Index of Mg-Ion-Implanted Silica Glass
- 23-P-06 Nano Crystalline and Smooth Surface Epilayer Formations of 3C-SiC at Low Temperatures Using Energetic Ions
- Lattice Distortion of GaAsBi Alloy Grown on GaAs by Molecular Beam Epitaxy
- Fe Deposition or Implantation into Vacuum Arc Deposited Cr Films