Heck Claire | National Institute Of Advanced Industrial Science And Technology Aist Kansai Laboratory Of Purified
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概要
- HECK Claireの詳細を見る
- 同名の論文著者
- National Institute Of Advanced Industrial Science And Technology Aist Kansai Laboratory Of Purified の論文著者
関連著者
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Heck Claire
National Institute Of Advanced Industrial Science And Technology Aist Kansai Laboratory Of Purified
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Horino Yuji
National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpn
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Horino Y
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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HORINO Yuji
National Institute of Advanced Industrial Science and Technology
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TSUBOUCHI Nobuteru
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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CHAYAHARA Akiyoshi
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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KINOMURA Atsushi
National Institute of Advanced Industrial Science and Technology
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Horiba Yasutaka
System Lsi Laboratory Mitsubishi Electric Corporation
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CHAYAHARA Akiyoshi
AIST Kansai
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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Chayahara Akiyoshi
Government Industrial Research Institute Osaka
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Hirano Y
Advanced Device Development Dept. Renesas Technology Corp.
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Kinomura A
National Institute Of Advanced Industrial Science And Technology
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Tsubouchi Nobuteru
Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology
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KINOMURA Atsushi
Osaka National Research Institute, AIST
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HORINO Yuji
Osaka National Research Institute, AIST
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TSUBOUCHI Nobuteru
Osaka National Research Institute
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CHAYAHARA Akiyoshi
Osaka National Research Institute
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HECK Claire
Osaka National Research Institute
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ABIKO Kenji
Institute for Materials Research, Tohoku University
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Chun Sung-yong
Department Of Materials Physics Osaka National Research Institute Aist
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CHAYAHARA Akiyoshi
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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CHAYAHARA Akiyoshi
National Institute of Advanced Industrial Science and Technology
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MIRANDA Rosalvo
Centro Universitario FEEVALE
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MIRANDA Marines
Instituto de Fisica, Universidade Federal do Rio Grande do Sul
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KINOMURA Atsushi
Department of Materials Physics, Osaka National Research Institute
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TSUBOUCHI Nobuteru
Department of Materials Physics, Osaka National Research Institute
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HECK Claire
Department of Materials Physics, Osaka National Research Institute
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HORINO Yuji
Department of Materials Physics, Osaka National Research Institute
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CHUN Sung-Yong
Osaka National Research Institute
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FUKUI Hirotaka
Adachi New Industrial Co., Ltd.
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Abiko Kenji
Institute For Materials Research Tohoku University
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Fukui Hirotaka
Adachi New Industrial Co. Ltd.
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Horino Yuji
Department Of Crystalline Materials Science Faculty Of Engineering Nagoya University
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Tsubouchi Nobuteru
Department Of Material Physics Osaka National Research Institute
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Chayahara Akiyoshi
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
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Baibich Mario
Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, RS, Brazil
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Horino Yuji
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
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Miranda Marines
Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, RS, Brazil
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Heck Claire
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
著作論文
- Silicon Carbide Film Growth Using Dual Isotopical ^Si^- and ^C^+ Ion species
- Formation of High Purity films by Negative Ion Beam Sputtering Using an Ultra-high Vacuum Self-Sputtering Method
- Formation of Ultra High Pure Metal Thin Films by Means of a Dry Process
- Macroparticle-Free Ti-Al Films by Newly Developed Coaxial Vacuum Arc Deposition
- Fe Deposition or Implantation into Vacuum Arc Deposited Cr Films