Fe Deposition or Implantation into Vacuum Arc Deposited Cr Films
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概要
- 論文の詳細を見る
The cylindrical cathode vacuum arc deposition method is used to produce pure Cr films on SiO2/Si(100) substrates. Deposition and implantation of Fe into the films were performed to study the influence of these processes on the structure of Cr. X-ray diffraction and cross-sectional transmission electron microscopy analyses are performed to establish the effects of spinodal decomposition in these materials.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-07-15
著者
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CHAYAHARA Akiyoshi
National Institute of Advanced Industrial Science and Technology
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MIRANDA Rosalvo
Centro Universitario FEEVALE
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MIRANDA Marines
Instituto de Fisica, Universidade Federal do Rio Grande do Sul
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Heck Claire
National Institute Of Advanced Industrial Science And Technology Aist Kansai Laboratory Of Purified
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Horino Yuji
National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpn
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Chayahara Akiyoshi
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
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Baibich Mario
Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, RS, Brazil
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Horino Yuji
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
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Miranda Marines
Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, RS, Brazil
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Heck Claire
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purified Materials, Ikeda, Osaka 563-8577, Japan
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