23-O-16 Hardness of DLC Deposited by Plasma Based Ion Implantation and Deposition Method Using Mixed RF and Negative High Voltage Pulses
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概要
- 論文の詳細を見る
- 日本セラミックス協会の論文
- 2003-09-29
著者
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Horino Y
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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MOKUNO Yoshiaki
National Institute of Advanced Industrial Science and Technology
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CHAYAHARA Akiyoshi
National Institute of Advanced Industrial Science and Technology
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TSUBOUCHI Nobuteru
National Institute of Advanced Industrial Science and Technology
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HORINO Yuji
National Institute of Advanced Industrial Science and Technology
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