CHAYAHARA Akiyoshi | AIST Kansai
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概要
関連著者
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CHAYAHARA Akiyoshi
AIST Kansai
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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CHAYAHARA Akiyoshi
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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Chayahara Akiyoshi
Government Industrial Research Institute Osaka
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Horino Y
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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HORINO Yuji
National Institute of Advanced Industrial Science and Technology
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Horiba Yasutaka
System Lsi Laboratory Mitsubishi Electric Corporation
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Horino Yuji
National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpn
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HORINO Yuji
AIST Kansai
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TSUBOUCHI Nobuteru
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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KINOMURA Atsushi
National Institute of Advanced Industrial Science and Technology
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Hirano Y
Advanced Device Development Dept. Renesas Technology Corp.
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Kinomura A
National Institute Of Advanced Industrial Science And Technology
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Tsubouchi Nobuteru
Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology
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SUGAWARA Yasuhiro
Department of Applied Physics, Graduate School of Engineering, Osaka University
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Sugawara Yasuhiro
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Uchihashi Takayuki
Department of Physics, Kanazawa University
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Okada T
Joint Research Center For Atom Technology (jrcat)
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OKUSAKO Takahiro
Department of Physics, Faculty of Science, Hiroshima University
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FUKANO Yoshinobu
Department of Physics, Faculty of Science, Hiroshima University
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MORITA Seizo
Department of Physics, Faculty of Science, Hiroshima University
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Ohta Takayuki
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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YAMANISHI Yoshiki
Advanced Technology Research Laboratories, Sumitomo Metal Industries Ltd.
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OASA Takahiko
Advanced Technology Research Laboratories, Sumitomo Metal Industries Ltd.
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CHAYAHARA Ayumi
Department of Physics, Faculty of Science, Hiroshima University
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Uchihashi Takayuki
Jrcat-angstrom Technology Partnership (atp)
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Uchihashi Takayuki
Department Of Mathematics And Physics Grad School Of Natural Science And Technology Kanazawa Univ.
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Heck Claire
National Institute Of Advanced Industrial Science And Technology Aist Kansai Laboratory Of Purified
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Morita Seizo
Department Of Electronic Engineering Faculty Of Engineering Iwate University
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Yamanishi Yoshiki
Advanced Technology Research Laboratories Sumitomo Metal Industries Ltd.
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Uchihashi Takayuki
Joint Research Center For Atom Technology(jrcat) Angstrom Technology Partnership
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Fukano Y
Department Of Physics Faculty Of Science Hiroshima University
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Sugawara Yasuhiro
Deparment Of Electrical Engineering Faculty Of Engineering Tohoku University
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Oe Kunishige
Department Of Electronics And Information Science Faculty Of Engineering And Design Kyoto Institute
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KINOMURA Atsushi
Osaka National Research Institute, AIST
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HORINO Yuji
Osaka National Research Institute, AIST
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TSUBOUCHI Nobuteru
Osaka National Research Institute
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CHAYAHARA Akiyoshi
Osaka National Research Institute
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HECK Claire
Osaka National Research Institute
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SARAIE Junji
Department of Electronics and Information Science, Kyoto Institute of Technology
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Saraie Junji
Department Of Electronic Engineering Faculty Of Engineering Kyoto University
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SHIKATA Shin-ichi
Diamond SAW Device Project, Sumitomo Electric Industries Ltd.
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OE Kunishige
Department of Electronics, Graduate School of Science and Technology, Kyoto Institute of Technology
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Chun Sung-yong
Department Of Materials Physics Osaka National Research Institute Aist
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CHAYAHARA Akiyoshi
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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YAMADA Hideaki
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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CHAYAHARA Akiyoshi
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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MOKUNO Yoshiaki
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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FUJIMORI Naoji
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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CHAYAHARA Akiyoshi
National Institute of Advanced Industrial Science and Technology
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MOKUNO Yoshiaki
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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KINOMURA Atsushi
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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HORINO Yuji
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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HORINO Yuji
Department of Materials Physics, Osaka National Research Institute
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YOSHIMOTO Masahiro
Department of Electrical Engineering, Kyoto University
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TAKEHARA Yuji
Department of Electronics and Information Science, Kyoto Institute of Technology
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Yoshimoto Masahiro
Department Of Electrical Engineering Kyoto University
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Horino Yuji
Department Of Crystalline Materials Science Faculty Of Engineering Nagoya University
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Mokuno Y
Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology
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Chayahara Akiyoshi
Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology
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Chayahara Akiyoshi
AIST Kansai, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Yoshimoto Masahiro
Department of Electronics and Information Science, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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Yoshimoto Masahiro
Cooperate Research Center, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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藤井 研一
阪大院理
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MURATA Satoshi
Department of Surgery, Shiga University of Medical Science
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KITAMURA Naoyuki
National Institute of Advanced Industrial Science and Technology
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FUKUMI Kohei
National Institute of Advanced Industrial Science and Technology
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TAKANO Hiromichi
Department of Physiology, Nagoya City University Medical School
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Fukumi Kohei
National Inst. Of Advanced Industrial Sci. And Technol.
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Fukumi K
National Inst. Advanced Industrial Sci. And Technol. Jpn
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ABIKO Kenji
Institute for Materials Research, Tohoku University
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Huang Wei
Department Of Electronics Information Science Kyoto Institute Of Technology
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Sugawara Y
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Yokota Kazuaki
Department Of Molecular Chemistry Graduate Shool Of Engineering Hokkaido University
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Fujii K
Osaka Univ. Osaka
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Fujii Ken-ichi
Department Of Physics Graduate School Of Science Osaka University
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Murata Satoshi
Department Of Computational Intelligence And Systems Science Interdisciplinary Graduate School Of Sc
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UMEZAWA Hitoshi
Diamond Research Center, AIST
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YOKOTA Katsuhiro
Faculty of Engineering, Kansai University
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CHAYAHARA Akiyoshi
Government Industrial Research Institute
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SODA Yousuke
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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HORINO Yuji
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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HECK Claire
National Institute of Advanced Industrial Science and Technology, AIST Kansai, Laboratory of Purifie
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MIRANDA Rosalvo
Centro Universitario FEEVALE
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MIRANDA Marines
Instituto de Fisica, Universidade Federal do Rio Grande do Sul
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BAINICH Mario
Instituto de Fisica, Universidade Federal do Rio Grande do Sul
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KINOMURA Atsushi
Department of Materials Physics, Osaka National Research Institute
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TSUBOUCHI Nobuteru
Department of Materials Physics, Osaka National Research Institute
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HECK Claire
Department of Materials Physics, Osaka National Research Institute
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CHUN Sung-Yong
Osaka National Research Institute
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FUKUI Hirotaka
Adachi New Industrial Co., Ltd.
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Fujimori Naoji
Diamond Research Center National Institute Of Advanced Industrial Science And Technology
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Fujimori Naoji
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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KUMAGAI Masao
Kanagawa Industrial Technology Research Institute
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TAGUCHI Kohshi
Department of Electronics and Information Science, Teikyo University of Science and Technology
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NISHI Junji
National Institute of Advanced Industrial Science and Technology
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SODEOKA Satoshi
National Institute of Advanced Industrial Science and Technology, Kansai Center
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YAMANAKA Hiroshi
National Institute of Advanced Industrial Science and Technology, Kansai Center
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Kitamura Naoyuki
National Institute Of Advanced Industrial Science And Technology Kansai Center
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Sodeoka S
National Inst. Advanced Industrial Sci. And Technol. Tsukuba Jpn
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Abiko Kenji
Institute For Materials Research Tohoku University
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Hirai K
Kanagawa High-technology Foundation
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Kumagai M
Kanagawa Industrial Technology Research Institute
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Shiomi Akira
Department Of Electronics Faculty Of Engineering Kansai University
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Fukui Hirotaka
Adachi New Industrial Co. Ltd.
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SAKAGUCHI Masanori
Department of Physiology, Keio University School of Medicine
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Kamai Masayoshi
Joining And Welding Research Institute Osaka University
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YOKOTA Katsuhiro
Department of Electronics, Faculty of Engineering, Kansai University
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YOSHIMOTO Masahiro
Cooperative Research Center, Kyoto Institute of Technology
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MORI Haruya
Department of Electronics, Faculty of Engineering, Kansai University
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FUJII Yoshie
Government Industrial Research Institute Osaka
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HIRAI Kiyohito
Kanagawa High-Technology Foundation, Kanagawa Science Park
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TAKANO Hiromichi
Kanagawa High-Technology Foundation, Kanagawa Science Park
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HONTANI Koji
Department of Physics, Faculty of Science, Hiroshima University
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Umezawa Hitoshi
Diamond Research Center Aist
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Umezawa Hitoshi
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Mori Haruya
Department Of Electronics Faculty Of Engineering Kansai University
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Nishi Junji
Optoelectronics Glass Group Photonics Research Institute National Institute Of Advanced Industrial S
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Yokota K
Kobe Univ. Kobe Jpn
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Shikata Shin-ichi
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Huang Wei
Department Of Biochemistry And Molecular Biology Beijing Normal University Beijing Key Laboratory
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Sodeoka Satoshi
National Institute Of Advanced Industrial Science And Technology Kansai Center
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Hontani Koji
Department Of Physics Faculty Of Science Hiroshima University
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Mokuno Yoshiaki
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Chayahara Akiyoshi
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Takano H
Department Of Physiology Nagoya City University Medical School
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Takano Hiromichi
Kanagawa High-technology Foundation
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Sakaguchi M
Univ. Tsukuba
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Sakaguchi Masanori
Department Of Cardiovascular Surgery Osaka City University Graduate School Of Medicine
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Yamanaka Hiroshi
National Institute Of Advanced Industrial Science And Technology Kansai Center
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Yamada Hideaki
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Fujimori Naoji
Diamond Research Center Aist
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Tsubouchi Nobuteru
Department Of Material Physics Osaka National Research Institute
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Taguchi Kohshi
Department of Electronics and Electrical Engieering, Fukuyama University
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Oe Kunishige
Department of Electronics and Information Science, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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Kumagai Masao
Kanagawa High-Technology Foundation, Kanagawa Science Park, Kawasaki, Kanagawa 213, Japan
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Horino Yuji
AIST Kansai, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Yokota Katsuhiro
Department of Electronics and High-Technology Research Center, Kansai University, 3-3-35 Yamate, Suita, Osaka 564-8680, Japan
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Huang Wei
Department of Electronics and Information Science, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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Takehara Yuji
Department of Electronics and Information Science, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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Murata Satoshi
Department of Bioengineering and Robotics, Graduate School of Engineering, Tohoku University
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Takano Hiromichi
Kanagawa High Technology Foundation Kanagawa Science Park
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Saraie Junji
Department of Electronics and Information Science, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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Murata Satoshi
Department of Electronics and Information Science, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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Umezawa Hitoshi
Diamond Res. Lab, National Inst. of Advanced Industrial Sci.
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Feng Gan
Venture Laboratory, Kyoto Institute of Technology, Sakyo, Kyoto 606-8585, Japan
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MURATA SATOSHI
Department of Agricultural Engineering, Kyushu University
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HUANG Wei
Department of Aeronautics and Astronautics, National Cheng Kung University
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SODEOKA Satoshi
National Institute of Advanced Industrial Science and Technology
著作論文
- Model of reactive microwave plasma discharge for growth of single-crystal diamond (Special issue: Advanced plasma science and its applications for nitrides and nanomaterials)
- Qualitative Correspondences of Experimentally Obtained Growth Rates and Morphology of Single-Crystal Diamond with Numerical Predictions of Plasma and Gas Dynamics in Microwave Discharges for Various Substrate Holder Shapes
- Fe Deposition or Implantation into Vacuum Arc Deposited Cr Films
- Ion-Beam 3C-SiC Heteroepitaxy on Si
- Epitaxial Growth of Pure ^Si Thin Films Using Isotopically Purified Ion Beams : Semiconductors
- Silicon Carbide Film Growth Using Dual Isotopical ^Si^- and ^C^+ Ion species
- Formation of High Purity films by Negative Ion Beam Sputtering Using an Ultra-high Vacuum Self-Sputtering Method
- Formation of Ultra High Pure Metal Thin Films by Means of a Dry Process
- Macroparticle-Free Ti-Al Films by Newly Developed Coaxial Vacuum Arc Deposition
- Chemical State and Refractive Index of Mg-Ion-Implanted Silica Glass
- Parameter Dependence of Stable State of Densely Contact-Electrified Electrons on Thin Silicon Oxide
- New Semiconductor GaNAsBi Alloy Grown by Molecular Beam Epitaxy
- Fabrication of 1 Inch Mosaic Crystal Diamond Wafers
- Dense Structure of SiN_x Films Fabricated by Radical Beam Deposition Method Using Hexamethyldisilazane
- Metastable GaAsBi Alloy Grown by Molecular Beam Epitaxy
- Metallic Alloy Coatings Using Coaxial Vacuum Arc Deposition
- Diffusivities and Activities of S Implanted into GaAs through an As-doped a-Si:H Film
- Time Dependent Dielectric Breakdown of Thin Silicon Oxide Using Dense Contact Electrification
- Time Evolution of Contact-Electrified Electron Dissipation on Silicon Oxide Surface Investigated Using Noncontact Atomic Force Microscope
- Spatial Distributions of Densely Contact-Electrified Charges on a Thin Silicon Oxide
- New Semiconductor GaNAsBi Alloy Grown by Molecular Beam Epitaxy
- New III–V Semiconductor InGaAsBi Alloy Grown by Molecular Beam Epitaxy
- Metastable GaAsBi Alloy Grown by Molecular Beam Epitaxy
- Dense Structure of SiNx Films Fabricated by Radical Beam Deposition Method Using Hexamethyldisilazane