HORINO Yuji | Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology

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概要

• 同名の論文著者
• Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technologyの論文著者

関連著者

• Horino Y

  Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)

• HORINO Yuji

  National Institute of Advanced Industrial Science and Technology

• TSUBOUCHI Nobuteru

  Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology

• CHAYAHARA Akiyoshi

  Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology

• MOKUNO Yoshiaki

  Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology

• KINOMURA Atsushi

  Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology

• HORINO Yuji

  Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology

• KINOMURA Atsushi

  National Institute of Advanced Industrial Science and Technology

• Horiba Yasutaka

  System Lsi Laboratory Mitsubishi Electric Corporation

• CHAYAHARA Akiyoshi

  AIST Kansai

• Chayahara Akiyoshi

  Department Of Electrical Engineering Hiroshima University

• Chayahara Akiyoshi

  Government Industrial Research Institute Osaka

• Hirano Y

  Advanced Device Development Dept. Renesas Technology Corp.

• Horino Yuji

  National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpn

• Kinomura A

  National Institute Of Advanced Industrial Science And Technology

• Mokuno Y

  Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology

• Chayahara Akiyoshi

  Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology

• Tsubouchi Nobuteru

  Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology

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著作論文

• Ion-Beam 3C-SiC Heteroepitaxy on Si
• Epitaxial Growth of Pure ^Si Thin Films Using Isotopically Purified Ion Beams : Semiconductors

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