FUJII Kanenaga | Government Industrial Research Institute
スポンサーリンク
概要
関連著者
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FUJII Kanenaga
Government Industrial Research Institute
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KIUCHI Masato
Government Industrial Research Institute
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Kiuchi M
National Inst. Advanced Industrial Sci. And Technol. Osaka Jpn
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Satoh Minoru
Nagaoka University Of Technology
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Satoh M
Tohoku Univ. Sendai Jpn
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CHAYAHARA Akiyoshi
Government Industrial Research Institute
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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Horino Y
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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HORINO Yuji
Government Industrial Research Institute
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SATOU Mamoru
Government Industrial Research Institute
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HORINO Yuji
National Institute of Advanced Industrial Science and Technology
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Hirano Y
Advanced Device Development Dept. Renesas Technology Corp.
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Satou Mamoru
Goverment Industrial Research Institute
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Horino Yuji
National Inst. Of Advanced Industrial Sci. And Technol. Kansai Osaka Jpn
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Horiba Yasutaka
System Lsi Laboratory Mitsubishi Electric Corporation
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SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
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TAKAI Mikio
Faculty of Engineering Science, and Research Center for Extreme Materials, Osaka University
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CHAYAHARA Akiyoshi
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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KINOMURA Atsushi
National Institute of Advanced Industrial Science and Technology
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Chayahara Akiyoshi
Government Industrial Research Institute Osaka
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Shimizu R
Osaka Univ. Osaka Jpn
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Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
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Takai Mikio
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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Kinomura A
National Institute Of Advanced Industrial Science And Technology
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Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
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Namba S
Inst. Physical And Chemical Research Wako
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Namba Susumu
Nagasaki Institute Of Applied Science
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Satoh Masaharu
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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SATOH Mamoru
Government Industrial Research Institute Osaka
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BEAG Young
Department of Applied Physics, Osaka University
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Satoh M
Department Of Physics Faculty Of Science Okayama University
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Namba Susumu
Frontier Research Program Riken
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Beag Y
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Beag Young
Department Of Applied Physics Osaka University
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Nagatomo S
Shizuoka Univ. Shizuoka Jpn
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Inoue M
Department Of Electrical Engineering Osaka Prefectural Technical College
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Inoue M
Osaka Inst. Technol. Osaka Jpn
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Inoue M
Setsunan Univ. Osaka Jpn
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Min K‐y
Department Of Applied Physics Osaka University
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Kang Hee
Department Of Dermatology Ajou University School Of Medicine
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TOMITA MASATO
Department of Orthopedic Surgery, Graduate School of Biomedicine, Nagasaki University
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Inoue Masami
Association Of Super-advanced Electronics Technologies (aset)
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Namba S
Japan Atomic Energy Res. Inst. Kyoto Jpn
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Namba S
Osaka Univ. Osaka
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Namba Susumu
Faculty Of Engineering Science Osaka University
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Tomita M
Ntt Sci. And Core Technol. Lab. Tokyo Jpn
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Inoue Masahiko
Department Of Neurology Showa University Fujigaoka Hospital
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Inoue M
Assoc. Super‐advanced Electronics Technol. (aset) Yokohama Jpn
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Inoue M
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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Inoue M
Kyoto Univ. Kyoto Jpn
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Inoue Masumi
Department Of Quantum Engineering Nagoya University
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KINOMURA Atsushi
Osaka National Research Institute, AIST
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KINOMURA Atsushi
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University
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KIMURA Yoshihide
Department of Applied Physics, Osaka University
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FUJIMOTO Fuminori
Institute of Scientific and Industrial Research, Osaka University
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TAKAI Mikio
Osaka University, Faculty of Engineering Science and Research Center for Extreme Materials
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MATSUO Takahiro
Osaka University, Faculty of Engineering Science and Research Center for Extreme Materials
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NAMBA Susumu
Osaka University, Faculty of Engineering Science and Research Center for Extreme Materials
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MOKUNO Yoshiaki
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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KINOMURA Atsushi
Government Industrial Research Institute Osaka
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MOKUNO Yoshiaki
Government Industrial Research Institute Osaka
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Inoue Masataka
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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Nonoyama Shinji
Quantum Material Research Laboratory Frontier Research Program The Institute Of Physical And Chemica
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Namba Susumu
Research Center For Extreme Materials And Department Of Electrical Engineering Osaka University
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Inoue M
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Kang Hee
Department Of Applied Physics Osaka University:department Of Physics Sciences Chungbuk National Univ
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Takai Mikio
Osaka Univ. Osaka Jpn
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MIN Kyung-Youl
Department of Applied Physics, Faculty of Engineering, Osaka University
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Kang H
Samsung Electronics Suwon Kor
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Souda R
National Institute For Research In Inorganic Materials
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Tomita Masato
Department Of Applied Physics Osaka University
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Min Kyung-youl
Department Of Applied Physics Osaka University
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Shimizu R
Department Of Information Science Osaka Institute Of Technology
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Kimura Yoshihide
Department Of Applied Physics Faculty Of Engineering Osaka University
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Kinomura Atsushi
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University:(present A
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Mokuno Y
Laboratory Of Purified Materials National Institute Of Advanced Industrial Science And Technology
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Fujimoto Fuminori
Institute Of Physics College Of General Education University Of Tokyo
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Fujimoto Fuminori
Institute Of Scientific And Industrial Research Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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Inoue Masahiko
Department Of Applied Physics Faculty Of Engineering Osaka University
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Shimizu Ryuichi
Department of Information Processing, Osaka Institute of Technology
著作論文
- High-Dose Implantation of MeV Carbon Ion into Silicon
- Three-Dimensional Analysis of Locally Implanted Atoms by MeV Helium Ion Microprobe
- Microbeam Line of MeV Heavy Ions for Materials Modification and In-Situ Analysis : Beam-Induced Physics and Chemistry
- Microbeam Line of MeV Heavy Ions for Materials Modification and In-Situ Analysis
- Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
- Focused High-Energy Heavy Ion Beams
- Optimization in Spot Sizes of Focused MeV Ion Beam by Precise Adjustment of Lens-Current Excitations : Nuclear Science, Plasmas and Electric Discharges
- Titanium Nitride Crystal Growth with Preferred Orientation by Dynamic Mixing Method
- Formation of Crystalline SiC Buried Layer by High-Dose Implantation of MeV Carbon Ions at High Temperature
- Reflectioru High Energy Electron Diffraction Observation of Dynamic Ion Beam Mixing Process in Titanium Nitride Crystal Growth