Min Kyung-youl | Department Of Applied Physics Osaka University
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概要
関連著者
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Min Kyung-youl
Department Of Applied Physics Osaka University
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Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
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Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
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Min K‐y
Department Of Applied Physics Osaka University
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SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
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MIN Kyung-Youl
Department of Applied Physics, Faculty of Engineering, Osaka University
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Souda R
National Institute For Research In Inorganic Materials
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Shimizu R
Department Of Information Science Osaka Institute Of Technology
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Shimizu R
Osaka Univ. Osaka Jpn
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Shimizu Ryuichi
Department of Information Processing, Osaka Institute of Technology
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Inoue M
Department Of Electrical Engineering Osaka Prefectural Technical College
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Inoue M
Osaka Inst. Technol. Osaka Jpn
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Inoue M
Setsunan Univ. Osaka Jpn
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Inoue Masami
Association Of Super-advanced Electronics Technologies (aset)
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Inoue Masahiko
Department Of Neurology Showa University Fujigaoka Hospital
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Inoue M
Assoc. Super‐advanced Electronics Technol. (aset) Yokohama Jpn
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Inoue M
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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Inoue M
Kyoto Univ. Kyoto Jpn
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Inoue Masumi
Department Of Quantum Engineering Nagoya University
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Inoue Masataka
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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Inoue M
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Inoue Masahiko
Department Of Applied Physics Faculty Of Engineering Osaka University
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KIUCHI Masato
Government Industrial Research Institute
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BEAG Young
Department of Applied Physics, Osaka University
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MITSUHASHI Riichirou
Department of Applied Physics, Faculty of Engineering, Osaka University
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TARUTANI Masayoshi
Department of Applied Physics, Faculty of Engineering, Osaka University
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Beag Y
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Beag Young
Department Of Applied Physics Osaka University
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Kiuchi M
National Inst. Advanced Industrial Sci. And Technol. Osaka Jpn
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Tarutani Masayoshi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Mitsuhashi R
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Mitsuhashi Riichirou
Department Of Applied Physics Faculty Of Engineering Osaka University
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Inoue Mitsuteru
Department Of Electrical & Electronic Engineering. Toyohashi University Of Technology
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Lee S
Photonics Research Center Korea Institute Of Science And Technology
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Lee Seok
Division Of Hematolgoy Catholic Hematopoietic Stem Cell Transplantation Center College Of Medicine T
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Lee Sang
Micro-electronics Technical Laboratory Etri
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FUJII Kanenaga
Government Industrial Research Institute
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KIMURA Yoshihide
Department of Applied Physics, Osaka University
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Lee Seok
Photonics Research Center Korea Institute Of Science And Technology
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IROKAWA Yoshihiro
Department of Applied Physics, Faculty of Engineering, Osaka University
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LEE Suchan
Department of Applied Physics, Faculty of Engineering, Osaka University
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SUZUKI Yosuke
Department of Applied Physics, Osaka University
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HOHMANN Siegfried
Department of Applied Physics, Osaka University
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Lee S
Department Of Hematology Catholic Blood And Marrow Transplantation Center College Of Medicine Seoul
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Kimura Yoshihide
Department Of Applied Physics Faculty Of Engineering Osaka University
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Irokawa Y
Toyota Central Res. & Dev. Lab. Inc. Aichi Jpn
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Nagatomi Takaharu
Department Of Applied Physics Osaka University
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Hohmann Siegfried
Department Of Applied Physics Osaka University:(present Address)max-plank-institut Fur Metallforshun
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Suzuki Yosuke
Department Of Applied Physics Osaka University
著作論文
- Surface Structure of Zr-O/W(100) System at 1700 K
- Anomaly in Sputtering on Titanium Nitride Film Growth by Post-Irradiation Processing
- Ion-Assisted Crystal Growth by Post Irradiation as Applied to Nitride Formatiorn
- Surface and Interface Study of Titanium Nitride on Si Substrate Produced by Dynamic Ion Beam Mixing Method
- Reflectioru High Energy Electron Diffraction Observation of Dynamic Ion Beam Mixing Process in Titanium Nitride Crystal Growth
- Angular Distributions of Sputtered Particles Ejected from Pure Cu, Pt and Cu -Pt Alloy under 3 keV Ar^+ Ton Bombardment