Nagatomi Takaharu | Department Of Applied Physics Osaka University

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概要

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著作論文

Development of Monte Carlo Simulation of Generation of Continuous and Characteristic X-Rays by Electron Impact (Short Note)
Flattening of Surface by Sputter-Etching with Low-Energy Ions : Instrumentation, Measurement, and Fabrication Technology
Continuum X-Ray Generation from W Film on Cu Substrate
Improvement in Discharge Delay Time by Accumulating Positive Wall Charges on Cathode MgO Protective Layer Surface in Alternating-Current Plasma Display Panels
Accumulation and Decay Characteristics of Exoelectron Sources at MgO Protective Layer Surface in Alternating-Current Plasma Display Panels
Analysis of Dopant Concentration in Semiconductor Using Secondary Electron Method
Surface Excitations in Surface Electron Spectroscopies Studied by Reflection Electron Energy-Loss Spectroscopy and Elastic Peak Electron Spectroscopy
Angular Distributions of Sputtered Particles Ejected from Pure Cu, Pt and Cu -Pt Alloy under 3 keV Ar^+ Ton Bombardment
Energy Distribution of Ion-Induced Secondary Electrons from MgO Surface
Monte Carlo Study of X-ray Generation from Film/Substrate Structure by Electron Impact
Extension of Atomic Mixing, Surface Roughness and Information Depth Model for Auger Electron Spectroscopy Sputter-Depth Profile Using Tilted Cylindrical Mirror Analyzer
Monte Carlo Simulation Study of Backscattered Electron Imaging in a Chemical Vapor Deposition Scanning Electron Microscope
Monte Carlo Modeling of Generation of Characteristic, Continuous and Fluorescent X-rays by Electron Impact
Surface Structure of Sc-O/W(100) System used as Schottky Emitter at High Temperature
Sputter Depth Profiling of Multiple Short-Period BN $\mathbf{\delta}$-Doped Si by Work Function Measurement

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