Surface Excitations in Surface Electron Spectroscopies Studied by Reflection Electron Energy-Loss Spectroscopy and Elastic Peak Electron Spectroscopy
スポンサーリンク
概要
著者
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TANUMA Shigeo
National Institute for Materials Science
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Tanuma Shigeo
Materials Analysis Station National Institute For Materials Science
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Tanuma Shigeo
Department Of Materials Infrastructures National Institute For Materials Science
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Nagatomi Takaharu
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Nagatomi Takaharu
Department Of Applied Physics Osaka University
関連論文
- Recent status of thin film analyses by XPS (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))
- Development of Monte Carlo Simulation of Generation of Continuous and Characteristic X-Rays by Electron Impact (Short Note)
- Flattening of Surface by Sputter-Etching with Low-Energy Ions : Instrumentation, Measurement, and Fabrication Technology
- X-ray Fluorescence Analysis of Cr^ Component in Mixtures of Cr_2O_3 and K_2CrO_4
- Calculation of depth distribution functions for CuO and SiO2 (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))
- Continuum X-Ray Generation from W Film on Cu Substrate
- Improvement in Discharge Delay Time by Accumulating Positive Wall Charges on Cathode MgO Protective Layer Surface in Alternating-Current Plasma Display Panels
- Auger depth profiling analysis using an inclined holder (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))
- An improved backscattering correction equation for wide analytical conditions on quantitative Auger analysis (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))
- Advances in Surface Chemical Analysis : From Fundamentals to Standardization
- Advances in Surface Chemical Analysis : From Fundamentals to Standardization
- Accumulation and Decay Characteristics of Exoelectron Sources at MgO Protective Layer Surface in Alternating-Current Plasma Display Panels
- Analysis of Dopant Concentration in Semiconductor Using Secondary Electron Method
- Surface Excitations in Surface Electron Spectroscopies Studied by Reflection Electron Energy-Loss Spectroscopy and Elastic Peak Electron Spectroscopy
- Angular Distributions of Sputtered Particles Ejected from Pure Cu, Pt and Cu -Pt Alloy under 3 keV Ar^+ Ton Bombardment
- Energy Distribution of Ion-Induced Secondary Electrons from MgO Surface
- Monte Carlo Study of X-ray Generation from Film/Substrate Structure by Electron Impact
- Extension of Atomic Mixing, Surface Roughness and Information Depth Model for Auger Electron Spectroscopy Sputter-Depth Profile Using Tilted Cylindrical Mirror Analyzer
- Monte Carlo Simulation Study of Backscattered Electron Imaging in a Chemical Vapor Deposition Scanning Electron Microscope
- Monte Carlo Modeling of Generation of Characteristic, Continuous and Fluorescent X-rays by Electron Impact
- Surface Structure of Sc-O/W(100) System used as Schottky Emitter at High Temperature
- Sputter Depth Profiling of Multiple Short-Period BN $\mathbf{\delta}$-Doped Si by Work Function Measurement