Advances in Surface Chemical Analysis : From Fundamentals to Standardization
スポンサーリンク
概要
- 論文の詳細を見る
- 2010-02-10
著者
-
TANUMA Shigeo
National Institute for Materials Science
-
Tanuma Shigeo
Materials Analysis Station National Institute For Materials Science
-
Tanuma Shigeo
Department Of Materials Infrastructures National Institute For Materials Science
関連論文
- Recent status of thin film analyses by XPS (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))
- X-ray Fluorescence Analysis of Cr^ Component in Mixtures of Cr_2O_3 and K_2CrO_4
- Calculation of depth distribution functions for CuO and SiO2 (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))
- Auger depth profiling analysis using an inclined holder (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))
- An improved backscattering correction equation for wide analytical conditions on quantitative Auger analysis (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))
- Advances in Surface Chemical Analysis : From Fundamentals to Standardization
- Advances in Surface Chemical Analysis : From Fundamentals to Standardization
- Surface Excitations in Surface Electron Spectroscopies Studied by Reflection Electron Energy-Loss Spectroscopy and Elastic Peak Electron Spectroscopy