Namba Susumu | Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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概要
- 同名の論文著者
- Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka Universityの論文著者
関連著者
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Namba Susumu
Faculty Of Engineering Science Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Gamo Kenji
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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GAMO Kenji
Faculty of Engineering Science, Osaka University
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Namba S
Riken The Institute Of Physical And Chemical Research
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Takai Mikio
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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TAKAI Mikio
Faculty of Engineering Science, and Research Center for Extreme Materials, Osaka University
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Namba Susumu
Frontier Research Program Riken
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Namba S
Inst. Physical And Chemical Research Wako
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Nonoyama Shinji
Quantum Material Research Laboratory Frontier Research Program The Institute Of Physical And Chemica
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Nagatomo S
Shizuoka Univ. Shizuoka Jpn
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Namba Susumu
Nagasaki Institute Of Applied Science
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Aritome Hiroaki
Faculty Of Engineering Osaka University
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Aritome H
Research Center For Extreme Materials Faculty Of Engineering Science Osaka University
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Namba S
Japan Atomic Energy Res. Inst. Kyoto Jpn
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Masuda Kohzoh
Faculty Of Engineering Science Osaka University
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Namba Susumu
Research Center For Extreme Materials And Department Of Electrical Engineering Osaka University
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Masuda Kohzoh
Material Science Tsukuba University
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Yasuoka Yoshizumi
Department Of Electrical And Electronic Engineering National Defense Academy
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Yuba Yoshihiko
Faculty Of Engineering Science Osaka University
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Matsui Shinji
Nippon Electric Co. Ltd
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Moriwaki Kazuyuki
Faculty Of Engineering Science Osaka University:(present Address) Electrical Communication Laborator
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Satoh Minoru
Nagaoka University Of Technology
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Satoh M
Tohoku Univ. Sendai Jpn
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CHAYAHARA Akiyoshi
Government Industrial Research Institute
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SATOU Mamoru
Government Industrial Research Institute
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Yuba Yoshihiko
Department Of Physical Science Graduate School Of Engineering Science Osaka University
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Ochiai Yukinori
Faculty Of Engineering Science Osaka University
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Sakamoto Toshitugu
Faculty Of Engineering Science Osaka University
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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Satou Mamoru
Goverment Industrial Research Institute
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Shiokawa Takao
Semiconductor Laboratory Riken The Institute For Physical And Chemical Research
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MATSUI Shinji
Faculty of Engineering Science, Osaka University
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Nakai Hideo
Department Of Industrial Chemistry Tokyo University Of Agriculture And Technology
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Namba S
Osaka Univ. Osaka
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Nakai Hiroyuki
Faculty Of Engineering Science Osaka University
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Yasuoka Yoshizumi
Department of Electronic Engineering, The National Defense Academy
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YUBA Yoshihiko
Faculty of Engineering Science, Osaka University
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SANDA Hiroyuki
Faculty of Engineering Science and Tesearch Center for Extreme Materials, Osaka University
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Yasuoka Y
National Defense Acad. Yokosuka‐shi Jpn
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Sanda Hiroyuki
Faculty Of Engineering Science And Tesearch Center For Extreme Materials Osaka University
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TANIGAWA Takaho
ULSI Device Development Laboratories NEC Corporation
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Tanigawa Takaho
Faculty Of Engineering Science Osaka University
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Minamisono Tadanori
Faculty of Science, Osaka University
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YAMATO Toshiya
Matsushita Electronics Corporation
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Kawabe Mitsuo
Faculty Of Engineering Science Osaka University
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HARAKAWA Kenichi
Department of Electronic Engineering, The National Defense Academy
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Harakawa K
Takenaka Corp. Inzai Jpn
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Gamo K
Osaka Univ. Osaka
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Namba S
Faculty Of Engineering Science Osaka University
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ARITOME Hiroaki
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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NAKASHIMA Shin-ichi
Faculty of Engineering, Osaka University
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MASUYAMA Akio
Faculty of Engineering, Toyo University
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Matsumoto T
Institute Of Scientific And Industrial Reserch Univ Of Osaka
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Masuyama A
Faculty Of Engineering Toyo University
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Masuyama Akio
Faculty Of Engineering Toyo University
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Iwaki Masaya
Institute Of Chemical And Physical Research
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Masuda Kohzoh
Faculty Of Engineering Science Osaka University:tsukuba University
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Ishibashi Koji
Department Of Applied Physics And Dimes Delft University Of Technology:the Institute Of Physical And
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Taniguchi H
Mitsubishi Cable Ind. Ltd. Hyogo Jpn
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He Xi
Faculty Of Engineering Science Osaka University:institute Of Semiconductor Processing Systems
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YOKOTA Katsuhiro
Faculty of Engineering, Kansai University
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Taniguchi H
Faculty Of Engineering Science Osaka University
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YAMAZAWA Masahiro
Faculty of Engineering Science, Osaka University
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MATSUMOTO Toshiharu
Faculty of Engineering Science, Osaka University
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SAKAMOTO Toshitugu
Faculty of Engineering Science, Osaka University
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TAKAGAKI Yukihiko
Faculty of Engineering Science, Osaka University
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TAKAOKA Sadao
Faculty of Science, Osaka University
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MURASE Kazuo
Research Center of Extreme Materials, Osaka University
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KINOMURA Atsushi
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University
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Yong Feng
Facully of Engineering Science and Research Center for Extreme Materials, Osaka university
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SANDA Hiroyuki
Central Research Laboratory, Glory Ltd.
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SHIGEMATU Hisao
Faculty of Engineering Science and Tesearch Center for Extreme Materials, Osaka University
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LU Yong
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University
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NAGATOMO Syohei
D. S. Scanner Co., Ltd.
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Gamo Kenji
Faculty Of Engineering Science Osaka University
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TOYODA Koichi
RIKEN, The Institute of physical and Chemical Research
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SHIOKAWA Takao
RIKEN, The Institute of Physical and Chemical Research
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Taniguchi H
Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer
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Taniguchi H
Kyushu Univ. Fukuoka Jpn
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Takagaki Y
Ntt Basic Res. Lab. Kanagawa Jpn
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Yamazawa M
Faculty Of Engineering Science Osaka University
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SHIHOYAMA Kazuhiko
Center for Optronics Products, HOYA Corporation
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Yong Feng
Facully Of Engineering Science And Research Center For Extreme Materials Osaka University
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ISHIHARA Shinji
Research Reactor Institute, Kyoto University
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KIMURA Itsuro
Research Reactor Institute, Kyoto University
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SHIMIZU Ryuichi
Faculty of Engineering, Osaka University
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SHIHOYAMA Kazuhiko
Faculty of Engineering, Toyo University
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Matsumoto Takuya
Institute Of Scientific And Industrial Reserch Univ Of Osaka
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Nishimura Tadashi
Faculty Of Engineering Science Osaka University
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Yamazawa Masahiro
Faculty Of Engineering Science Osaka University
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Kimura Itsuro
Research Reactor Institute Kyoto University
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Hirai Koichi
Yakult Institute For Microbiological Research
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Masuda Noboru
Faculty Of Engineering Science Osaka University
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Ishibashi K
Advanced Device Laboratory The Institute Of Physical And Chemical Research (riken)
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Ishibashi K
Department Of Applied Physics And Dimes Delft University Of Technology:the Institute Of Physical And
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Ugumori Tadaki
Faculty Of Engineering Science Osaka University:technical College Yamaguchi University
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HIRAI Kouichi
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University
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UKEGAWA Takeshi
Faculty of Engineering Science, Osaka University
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Ishihara Shinji
Research Reactor Institute Kyoto University
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Shimizu R
Osaka Univ. Osaka Jpn
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Akasaka Youichi
Faculty Of Engineering Science Osaka University
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Aritome Hiroaki
Faculty Of Engineering Science Osaka University
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Hirai Kouichi
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Tokuda Jun
Faculty Of Engineering Science Osaka University
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Shihoyama Kazuhiko
Center For Optronics Products Hoya Corporation
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Ukegawa Takeshi
Faculty Of Engineering Science Osaka University
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Shigematu Hisao
Faculty Of Engineering Science And Tesearch Center For Extreme Materials Osaka University
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Kinomura Atsushi
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University:(present A
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Yokota Katsuhiro
Faculty Of Engineering Kansai University
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Ishihara Shinji
Research Teactor Institute Kyoto University
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邑瀬 和生
大阪教養
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Tamura Shigeharu
Government Industrial Research Institute
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OKAMOTO Hiroaki
Faculty of Engineering Science, Osaka University
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Takuma Hiroshi
Institute For Laser Science University Of Electro-communications
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Murase K
Ntt Corp. Kanagawa Jpn
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Hara Hideo
Institute For Laser Science University Of Electro-communications
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Masui Norio
Faculty Of Engineering Science Osaka University
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Satoh Masaharu
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Izumi Masahiro
Faculty Of Engineering Science Osaka University
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MURASE Kazuo
Faculty of Science, Osaka University
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YAMASHITA Kazuhiro
Faculty of Life Sciences, Toyo University
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Ishikawa Y
Dowa Mining Co. Ltd. Tokyo
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YOKOI Naoki
Faculty of Engineering Science, and Research Center for Extreme Materials, Osaka University
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ZHANG Yu
Faculty of Engineering Science, Osaka University
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TOBA Hiroshi
Faculty of Engineering Science, Osaka University
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Aoyagi Yoshinobu
Riken
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TANIGICHI Hiroaki
Faculty of Engineering Science, Osaka University
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TANIGUCHI Hiroaki
Faculty of Engineering Science, Osaka University
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Inoue Ken-ichi
Electronics Research Laboratory Kobe Steel Ltd.
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ISHIBASHI Kiyotaka
Electronics Research Laboratory, Kobe Steel, Ltd.
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KAWATA Yutaka
Electronics Research Laboratory, Kobe Steel, Ltd.
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FUJII Kanenaga
Government Industrial Research Institute
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NAGATOMO Syohei
D.S. Scanner Co., Ltd
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Gamo Kenji
Faculty Of Engineering Science And Reseatch Center For Extreme Materials
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CHAYAHARA Akiyoshi
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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KINOMURA Atsushi
National Institute of Advanced Industrial Science and Technology
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HARA Tamio
RIKEN, The Institute of Physical and Chemical Research
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Murase Kazuo
Faculty Of Science Osaka University
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Taniguchi Hiroaki
Faculty Of Engineering Science Osaka University
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Toba Hiroshi
Faculty Of Engineering Science Osaka University:(present Address)yokosuka Electrical Communication L
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Nakamura Takehiro
Faculty Of Engineering Science Osaka University
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Satoh M
Department Of Physics Faculty Of Science Okayama University
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Okamoto Hiroaki
Faculty Of Engineering Science Osaka University
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Lu Y
National Univ. Singapore Singapore
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NAFATOMO Syohei
D.S. Scanner Co.Ltd.
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Xu Zheng
Faculty of Engineering Science, Osaka University
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KOSUGI Toshihiko
Faculty of Engineering Science, Osaka University
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ISHIDA Shuichi
Science University of Tokyo in Yamaguchi
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Ishikawa Yutaka
Department Of Electrical And Electronics Engineering Nippon Institute Of Technology
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Nakamichi Ichiro
Department Of Electrical And Electronics Engineering Nippon Institute Of Technology
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Kosugi Toshihiko
Department Of Electric Engineering Faculty Of Engineering Science Osaka University
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Murakami Kouichi
Faculty Of Engineering Science Osaka University
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Miyauchi Michihiro
Faculty Of Engineering Osaka University
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Chayahara Akiyoshi
Government Industrial Research Institute Osaka
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Agawa Yoshiaki
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University:ulvac Japa
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Zhang Yu
Faculty Of Engineering Science Osaka University
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KOSUGI Toshihiko
NTT Wireless System Laboratories
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Tamura S
Sony Corp. Yokohama Jpn
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Xu Z
Saga Univ. Saga
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Murase K
Graduate School Of Science Osaka University
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Ohsawa Akira
Faculty Of Engineering Science Osaka University
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Tamura Susumu
Faculty Of Engineering Kansai University
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Kawata Yutaka
Electronics Research Laboratory Kobe Steel Ltd.
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Ishida Shuichi
Division Of Cardiovascular Medicine Department Of Internal Medicine Ohmori Hospital Toho University
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Sayama Hirokazu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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ISHIBASHI Kiyotaka
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University
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Mizobuchi Akira
Department Of Nuclear Science Faculty Of Science Osaka University
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Yamashita Kazuhiro
Faculty Of Engineering Science Osaka University
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Namba Susumu
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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INOM0T0 Yasumasa
Faculty of Engineering Science, Osaka University
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KA Ki
Faculty of Engineering Science, Osaka University
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KAJIYA Atsuhiro
Faculty of Engineering Science, Osaka University
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HARADA Takeshi
Faculty of Engineering Science, Osaka University
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ARIMOTO Kazutami
Faculty of Engineering Science, Osaka University
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Kotani Hideo
Faculty Of Engineering Science Osaka University
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Hoshino Akihiro
Institute for Laser Science, University of Electro-Communications
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Takuma Hiroshi
Institute For Laser Science The University Of Electro-communications
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Hasegawa Shinya
Faculty Of Engineering Science Osaka University
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Kaneko Hidehiko
Department of Electronic Engineering, The National Defense Academy
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TSUCHIMOTO Junichi
Faculty of Engineering Science, Osaka University
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TOKUDA Jun
Faculty of Engineering Science, Osaka University
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Inom0t0 Yasumasa
Faculty Of Engineering Science Osaka University
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USHIKU Kenji
Faculty of Engineering Science, Osaka University
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MIZOBUCHI Akira
Faculty of Engineering Science, Osaka University
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GOSHI Hiroo
Faculty of Engineering Science, Osaka University
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IWAKI Masaya
Faculty of Engineering Science, Osaka University
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Ka Ki
Faculty Of Engineering Science Osaka University
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Tamura N
Ritsumeikan Univ. Shiga Jpn
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Ushiku Kenji
Faculty Of Engineering Science Osaka University
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Goshi Hiroo
Faculty Of Engineering Science Osaka University
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Hashimoto Hatsujiro
Faculty Of Engineering Okayama University Of Science
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Kinomura A
National Institute Of Advanced Industrial Science And Technology
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Hamagaki Manabu
Riken
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KOH Youn-Kyu
Faculty of Engineering Science, Osaka University
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HAMAKAWA Yohihiro
Faculty of Engineering Science, Osaka University
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Koh Youn-kyu
Faculty Of Engineering Science Osaka University:department Of Physics Yonsei University
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SHIOKAWA Takao
Institute of Physical and Chemical Research
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Emoto F
Matsushita Electronics Corp. Takatsuki Jpn
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SAKANO Kiyoji
Faculty of Engineering Science, Osaka University
著作論文
- Ion Beam Etching of InP. II. Reactive Etching with Halogen-Based Source Gases
- Ion Beam Etching of InP. I. Ar Ion Beam Etching and Fabrication of Grating for Integrated Optics
- Low-Energy Ion-Beam Irradiation Effects on Two-Dimensional Electron Gas in Modulation-Doped AlGaAs/ GaAs Heterostructure : Micro/nanofabrication and Devices
- Low-Energy Ion-Beam Irradiation Effects on Two-Dimensional Electron Gas in Modulation-Doped AlGaAs/GaAs Heterostructure
- Magnetic Analysis of Quadrupole Lens for MeV Ion Microprobe
- Three-Dimensional Analysis of Locally Implanted Atoms by MeV Helium Ion Microprobe
- Etching Rate Control by MeV O^+ Implantation for Laser-Chemical Reaction of Ferrite : Beam-Induced Physics and Chemistry
- Local Control of Magnetic Property in Stainless Steel Surface by Ion and Laser Beams : Beam-Induced Physics and Chemistry
- Local Control of Magnetic Property in Stainless Steel Surface by Ion and Laser Beams
- Etching Rate Control by MeV O^+ Implantation for Laser-Chemical Reaction of Ferrite
- Laser-Induced Etching of Mn-Zn ferrite and Its Application : Etching and Deposition Technology
- Ion Beam Assisted Deposition of Tungsten on GaAs
- Ion Beam Assisted Maskless Etching of GaAs by 50 keV Focused Ion Beam
- Maskless Etching of AN Using Focused Ion Beam
- Maskless Ion Beam Assisted Etching of Si Using Chlorine Gas
- Exciton Absorption in GaSe under Intense Excitation
- Luminescence due to Exciton-Electron and Exciton-Exciton Collisions in GaSe
- Influence of Beam Current Ripple on Secondary Electron and RBS Mapping Images
- Nanometer Pattern Delineation by Electron and Ion Beam Lithography
- B, As and Si Field Ion Sources
- Field Ion Sources Using Eutectic Alloys
- Fabrication of Niobium Weak Links by Means of Electron Beam Lithography and Ion Implantation : C-1: JOSEPHSON DEVICES
- Fabrication and DC Characteristics of Nb Vertical Type Microbridges
- An Assessment of e-Beam Controlled Discharge Pumping in KrF and XeCl Lasers
- Fabrication of Submicron Contact Hole with a Focused Ion Beam
- Self-Developing Characteristics of Nitrocellulose Exposed to Ion Beams
- CO_2 Laser Detection Using a Warm Carrier Device with a Thin Film Antenna
- Damage during Microchanneling Analysis Using 400 keV Helium Ion Microprobe
- Residual Local Strain in Gallium Arsenide Induced by Laser Pyrolytic Etchingin CCl_4 Atmosphere
- Local Temperature Rise during Laser Induced Etching of Gallium Arsenide in SiCl_4 Atmosphere
- Maskless Dry Etching of Gallium Arsenide with a Submicron Line-Width by Laser Pyrolysis in CCl_4 Gas Atmosphere
- Laser Induced Local Etching of Gallium Arsenide in Gas Atmosphere
- Optical Waveguiding and Electrooptic Modulation in Ion-Implanted CdTe
- Optical Waveguides Fabricated by B Ion Implanted into Fused Quartz
- A Large Time Delay of the Stimulated Emission in CdS Laser Pumped by an Electron Beam
- Increase in T_c of Nb Films Implanted with N^+_2
- Ion-Implanted Arsenic Profiles in GaAs Encapsulated by SiO_2 and Si_3N_4
- Control of T_c for Niobium by N Ion Implantation
- Comparison between Concentration Profiles of Arsenic Implanted in Silicon Measured by Means of Neutron Activation Analysis and Radioactive Ion Implantation
- Paramagnetic Defects Induced in Naphthalene and Anthracene Single Crystals by Neutron Irradiation at Low Temperature
- Stimulated Emission from CdS Thin Films Excited by N_2 Laser
- Electroluminescence of Green Light Region in Doped Anthracene
- Residual Strain in Single Crystalline Germanium Islands on Insulator
- Thickness Dependence of SiO_2 Capping Layers on Recrystallization of Germanium Islands on Insulator
- Gallium Arsenide Layers Grown by Molecular Beam Epitaxy on Single Crystalline Germanium Islands on Insulator
- Single Crystalline Germanium Island on Insulator by Zone Melting Recrystallization
- Electrical Properties of Laser-Annealed Glow-Discharge Amorphous Silicon Layers
- Quantum Transport in PtSi Thin Films and Narrow Wires
- Self-Development Properties of Nitrocellulose for Focused Ion Beam Lithography : Techniques, Instrumentations and Measurement
- Contrast of the X-Ray Mask for Synchrotron Radiation and the Characteristics of Replicated Pattern
- A Blazed Si Grating for Soft X-Ray Fabricated by Two-Stage Reactive Ion-Beam Etching
- Graphoepitaxy of Ge Films on SiO_2 by Zone Melting Recrystallization
- Fabrication of 80 nm-Wide Lines in FPM Resist by H^+ Beam Exposure
- Fabrication of Si0_2 Grating Patterns with Vertical Sidewalls by S0R X-Ray Lithography and Reactive Ion-Beam Etching
- Etched Profile of Si by Ion-Bombardment-Enhanced Etching
- Reactive Ion-Beam Etching of Silicon Carbide
- Microfabrication of LiNbO_3 by Reactive Ion-Beam Etching
- Fabrication of SiO_2 Blazed Holographic Gratings by Reactive Ion-Etching
- Fabrication of a Grating Pattern with Submicrometer Dimension in Silicon Crystal by Ion-Bombardment-Enhanced Etching
- Stoichiometric Change in Gallium Arsenide after Laser-Induced Thermochemical Etching
- Microanalysis by Focused MeV Helium Ion Beam
- 8 nm Wide Line Fabrication in PMMA on Si Wafers by Electron Beam Exposure
- A Stable High-Brightness Electron Gun with Zr/W-tip for Nanometer Lithography. : I. Emission Properties in Schottky- and Thermal Field-Emission Regions
- Direct Writing of Gratings by Electron Beam in Poly(metyl methacrylate) Optical Waveguides
- Change in Scanning Tunneling Microscope (STM) Tip Shape during Nanofabrication
- Focused Ion Beam Technology : Beam Induced Physics and Chemistry
- Focusing Characteristics of X-Ray Zone Plates Fabricated by Electron Beam Lithography and Reactive Ion Etching
- Maskless Submicrometer Pattern Formation of Cr Films by Focused Sb Ion Implantation
- Induced Defects in GaAs Etched by Low Energy Ions in Electron Beam Excited Plasma (EBEP) System
- Characteristics of Ion Beam Assisted Etching of GaAs Using Focused Ion Beam: Dependence on Gas Pressure
- Pulse Laser Annealing Effects in Si-Implanted GaAs
- The Enhanced and Suppressed Electroless Plating of Copper by UV-Irradiation : Chemistry (incl. physical process)
- Electrical Evaluation of Defects Induced in Silicon by High Energy Boron Ion Implantation
- Laser-Induced Etching of Mn–Zn Ferrite and Its Application
- Self-Development Properties of Nitrocellulose (Dependence on Ion Energies)
- Self-Development Properties of Nitrocellulose (Dependence on Ion Species)
- Characteristics of Be–Si–Au Ternary Alloy Liquid Metal Ion Sources