The Effect of Ejection Angle in Ion-Beam Sputter Deposition of Superconducting Amorphous Beryllium Film
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概要
- 論文の詳細を見る
Ion-beam sputter-deposited amorphous Be films on silica substrates at different ejection angles are characterized by their superconducting properties. It is shown that the superconducting transition temperature of the film is varied by changing the ejection angle of the sputtered particles. To explain this, the role of incorporated oxygen and the contribution of highly energetic particles to the amorphous Be formation are discussed, taking account of both the anisotropic ejection of the direct recoiled target atoms measured by time-of-flight and the result of a Monte Carlo simulation of Be sputtering. The Monte Carlo simulation describes the angular distribution of the sputtered atoms with considerable success and is particularly helpful in revealing the contribution of energetic sputtered atoms of higher than 100 eV at low ejection angles.
- 社団法人応用物理学会の論文
- 1990-03-20
著者
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SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
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BEAG Young
Department of Applied Physics, Osaka University
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MAEDA Yasushi
NTT Basic Research Laboratories
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TAKEI Koji
NTT Basic Research Laboratories
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Beag Young
Department Of Applied Physics Osaka University
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Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
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Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
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