Surface Analyzer Combining Secondary Ion Mass Spectrometry and Ion Scattering Spectrometry(速報)
スポンサーリンク
概要
著者
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SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
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Tamura Hifumi
Central Research Laboratory Hitachi Ltd.
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Ishitani Tohru
Central Research Laboratory Hitachi Lid.
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Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
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Itoh Michiyasu
Central Research Laboratory, Hitachi Ltd.
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Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
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ISHITANI TOHRU
Central Research Laboratory, Hitachi Ltd.,
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TAMURA HIFUMI
Central Research Lab., Hitachi Ltd.
関連論文
- High Contrast Observation of Magnetic Domain with High Voltage SEM
- Calculation of X-Ray Production in Alloy Targets by New Approach Using Monte Carlo Method
- Anisotropic Emission of Secondary Electrons from Fe(110) Single Crystal
- Monte Carlo Simulation for Auger Depth Profiling of GaAs/AlAs Superlattice Structure by Ar^+ Ion Sputtering
- Auger Depth Profiles of a GaAs/AlAs Superlattice Structure Obtained with O^+_2 and Ar^+ Ion Sputtering
- Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
- Titanium Nitride Crystal Growth with Preferred Orientation by Dynamic Mixing Method
- Electron Impact Spectra of Mercury in Intermediate Energies
- Spin-Polarization and Differential Cross Section of Electron-Mercury Inelastic Scattering
- Detection of SiO_2-Ions from SiO_2-Si Interface by Means of SIMS
- Fourier analysis of HRTEM image deterioration caused by mechanical vibration
- Nano-area electron diffraction pattern reconstructed from three-dimensional Fourier spectrum
- Real-time observation of spherical aberration-free phase image using high-speed image processing CCD video camera
- Monte Carlo Simulation of Generations of Continuous and Characteristic X-Rays by Electron Impact
- Optimization of voltage axis alignment in high-resolution electron microscopy
- Development of a real-time defocus-image modulation processing electron microscope. II. Dynamic observation of spherical aberration-free phase image of surface atoms
- Development of a real-time defocus image modulation processing electron microscope. I. Construction
- TEM Study of the Interface Structure of CVD Diamond Heteroepitaxilly Grown on Pt(111) Substrate
- Preliminary experiments for development of real-time defocus-image modulation processing electron microscope
- Cross-Sectional Transmission Electron Microscope Observation of Isolated Diamond Particles Heteroepitaxially Grown on Pt(111) Substrate
- Observation of Al surface during sputter-cleaning and annealing procedures under UHV-REM
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography : Micro/nanofabrication and Devices
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography
- Extraction of Spherical and Chromatic Aberration -free Information by Focal-depth Extension Processing Under Tilted Illumination
- Interaction Potential between He^+ and Ti in a keV Range as Revealed by a Specialized Technique in Ion Scattering Spectroscopy
- Surface Structure of Zr-O/W(100) System at 1700 K
- Anomaly in Sputtering on Titanium Nitride Film Growth by Post-Irradiation Processing
- Work Function Change Measured by Electron Beam Chopping Technique as Applied to Oxygen-Adsorbed W(100) at High Temperature
- Ion-Assisted Crystal Growth by Post Irradiation as Applied to Nitride Formatiorn
- Study on Zr-Si/W(100) Surface at High Temperatures by Reflection High Energy Electron Diffraction
- Study on Zr-Si/W(100) Surface at High Temperatures by Combined Surface Analysis Techniques
- Monte Carlo Simulation Approach to Sputtering in Multi-Component Targets
- Approximation Formula of Cross-section for the Universal Potential Expression Proposed by Ziegler et al.
- Aluminum-Line Cutting End-Monitor Utilizing Scanning-Ion-Microscope Voltage-Contrast Images
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization. : III. Change of the Velocity Distribution with Time after Sputtering
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization. : II. A Quantitative Composition Analysis of Cu-Al Alloy
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization : I. Development of Laser Ion Counting System with a Simple Time-of-Flight Measurement
- Reflection of keV Light Particles from Random Solidsby Modified Single-Collision Model
- A New Bessel-Box Energy Analyzer for Sputtered Neutral Mass Spectrometry
- An Application of Square Wave Modulation Technique to Scanning Auger Electron Microscopy
- Formation of "bcc Boundary Phase" in Transmission Electron Microscopy Samples of Nd-Fe-B Sintered Magnets
- Coercivity and Grain Boundary Morphology in Nd-Fe-B Sintered Magnets
- A Plasma Ion Gun with Pierce Electrode
- Auger Study of Preferential Sputtering for Cu-Ni Alloy Sample
- Distortion of Elastically Scattered Electron Energy Spectrum in a Retarding Field Type Spectrometer
- LEED-Work Function Studies on Fe(100)
- Photoelectric Work Function Study on Iron (100) Surface Combined with Auger Electron Spectroscopy
- Continuum X-Ray Generation from W Film on Cu Substrate
- High Dose Rate Effect of Focused-Ion-Beam Boron Implantation into Silicon
- Sputtering of Si with keV Ar^+ Ions : II.Computer Simulation of Sputter Broadening Due to Ion Bombardment in Depth Profiling
- Sputtering of Si with keV Ar^+ Ions. : I. Measurement and Monte Carlo Calculations of Sputtering Yield
- Calculation of Electron Spin Polarization for Polarization Detector
- New Computer Simulation Software of Electron Trajectories for Evaluation of Magnetic Field Immersion-Type Field Emission Gun
- Accumulation Effect of Bombarding N^+_2 Ions in Al for Crystal Growth of AlN Film
- Study of Accumulation Effect of Bombarding N^+_2 Ions on Al Surface by Auger Electron Spectroscopy
- New Neutral- and Ion-Scattering Spectroscopy as Applied to Selective Adsorption of Hydrogen on Cu-Pt Alloy Surfaces
- Comparison of Energy-Loss Functions from Reflection Electron Energy-Loss Spectroscopy Spectra with Surface and Bulk Energy-Loss Functions : in Case of Cu
- Study on the Resolution of the Backscattered Electron Image by the Monte Carlo Method
- Monte Carlo Calculations on Electron Scattering in a Solid Target
- A New Type Edge Effect in High Resolution Scanning Electron Microscopy
- Stability of Beam Current of Single Crystal LaB_6 Cathode in High Vacuum
- Field Emission Pattern of LaB_6-Single Crystal Tip
- Cross-Sectional Transmission Electron Microscopic Observation of Etch Hillocks and Etch Pits in LiTaO_3 Single Crystal
- Basic Study of Quantitative Ion Scattering Spectroscopy I Correction Factors for Quantification
- Surface and Interface Study of Titanium Nitride on Si Substrate Produced by Dynamic Ion Beam Mixing Method
- Reflectioru High Energy Electron Diffraction Observation of Dynamic Ion Beam Mixing Process in Titanium Nitride Crystal Growth
- Submicron Channel MOSFET Using Focused Boron Ion Beam Implantation into Silicon
- Light and Secondary Ion Emissions from Ion Bombarded Solid Surfaces
- Monte Carlo Simulation of Energetic Ion Behavior in Amorphous Targets
- The Effect of Ejection Angle in Ion-Beam Sputter Deposition of Superconducting Amorphous Beryllium Film
- Construction of Retarding Field Cylindrical Mirror Analyzer
- Anomaly in Sputtering of Aluminum under N^+_2 Ion Bombardment
- Weibull Distribution of X-Ray Pulse-Height
- A Study on Electron Diffusion in X-ray Microanalyzer Specimen
- An Approach for Nanolithography Using Electron Holography
- Micromachining and Device Transplantation Using Focused Ion Beam : Etching and Deposition Technology
- Micromachining and Device Transplantation Using Focused Ion Beam
- Proposal for Device Transplantation using a Focused Ion Beam
- A New Secondary Ion Extractor with Pierce Electrode
- Nanoprobe cathodoluminescence scanning electron microscope as aplied to synthesized diamond
- Electrical Properties of Focused-Ion-Beam Boron-Implanted Silicon
- Extracted-Beam Divergence Calculations for a Liquid-Metal Ion Source
- Observation of Reconstructed Pt(100) Surface by Reflection Electron Microscopy
- Computer Simulation Analysis of the Planar Channeling Effect in Practical Ion Implantation : Semiconductors and Semiconductor Devices
- Cross-sectional High-Resolution Transmission Electron Microscope Study of Heteroepitaxial Diamond Film Grown on Pt Substrate
- Droplet and Cluster Ion Emission from Ga and In Liquid Metal Ion Sources
- Focused Ion Beam Induced Deposition in the High Current Density Region : Focused Ion Beam Process
- Focused Ion Beam Induced Deposition in the High Current Density Region
- Growth of Tungsten Film by Focused Ion Beam Induced Deposition
- Simple Calculation on Topography of Focused-Ion-Beam Sputtered Surface
- Focused-Ion-Beam Broadening Due to Collisions with Residual Gas Atoms
- Boron and Phosphorus Jon Emissions from a Cu-P-Pt-B Liquid Metal Ion Source
- Mass and Energy Analyses of Gallium-Indium Liquid-Metal-Ion Sources
- Development of Phosphorus Liquid-Metal-Ion Source
- Emission of Doubly Charged Dimer Ions from Liquid-Metal Ion Sources : Techniques, Instrumentations and Measurement
- A New Droplet Breakup Model for Dimer Ion Formation from a Gallium Liquid Metal Ion Source
- Carbon Needle Emitter for Boron and Aluminum Ion Liquid-Metal-Ion Sources
- Ion Range and Damage Calculations Using the Boltzmann Transport Equation
- Ion Microprobe Analyzer with Wien Filter for Primary Ion Mass Separation(速報)
- Surface Analyzer Combining Secondary Ion Mass Spectrometry and Ion Scattering Spectrometry(速報)