Simple Calculation on Topography of Focused-Ion-Beam Sputtered Surface
スポンサーリンク
概要
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An analytical model of surface topography evolution during ion sputtering is applied to investigate the eroded profile in a steady state during scanning focused-ion-beam (FIB) sputtering. Some calculations are carried out to demonstrate the eroded profile under the known parameters, i.e. sputtering yield as a function of ion incident angle, the FIB profile, and the FIB scan speed. The present approach is useful to obtain roughly the characteristics of FIB sputtering such as the erosion rate and the length and gradient angle of the step-like slope formed on the eroded surface.
- 社団法人応用物理学会の論文
- 1989-02-20
著者
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Ishitani Tohru
Central Research Laboratoty Hitachi Ltd.
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Ishitani Tohru
Central Research Laboratory Hitachi Lid.
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OHNISHI Tsuyoshi
Central Research Laboratory, Hitachi, Ltd
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Ohnishi Tsuyoshi
Central Research Laboratoty Hitachi Ltd.
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