Boron and Phosphorus Jon Emissions from a Cu-P-Pt-B Liquid Metal Ion Source

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概要

• 論文の詳細を見る

• A liquid metal ion source using a Cu-P-Pt-B alloy has been developed to emit both boron and phosphorus ions for maskless ion implantation. The relative flux intensities of B^+ and P^<2+> to total ion flux are 13 and 15%, respectively, at total ion current, I_T, of 30 μA. These ions are separable by mass separator with a low mass-resolving power of m/Δm≃10. A source lifetime of more than 30 hours has been achieved at I_T=10〜50 μA.

• 社団法人応用物理学会の論文
• 1986-11-20

著者

• Tamura H

  R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.

• Ishitani T

  Semiconductor Energy Lab. Co. Ltd. Kanagawa Jpn

• Tamura Hifumi

  Central Research Laboratory Hitachi Ltd.

• Umemura K

  Frontier Research Program The Institute Of Physical And Chemical Research (riken)

• Ishitani T

  Central Research Laboratory Hitachi Ltd

• Ishitani Tohru

  Central Research Laboratory Hitachi Lid.

• Tamura Hitoshi

  Mechanical Engineering Research Laboratory Hitachi Ltd.

• Tamura Hideki

  Faculty Of Eng. Yamagata Univ.

• UMEMURA Kaoru

  Central Research Laboratory, Hitachi Ltd.

• TAMURA HIFUMI

  Central Research Lab., Hitachi Ltd.

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