Applicability of TiN Adhesion Layer Formed by Nitridation of Sputtered Ti Film to Blanket CVD-W Contact Filling
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-05-15
著者
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Tamura H
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Chen S‐c
National Taiwan Normal Univ. Taipei Twn
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Chen Shih-chang
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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TAMURA Hiroyuki
VLSI R&D Center, Oki Electric Industry Co. Ltd.
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Sakamoto Akihiro
Process Technology Center Oki Electric Industry Co. Ltd.
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YOSHIMARU Masaki
VLSI R&D Center, OKI Electric Industry Co., Ltd.
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INO Masayoshi
VLSI R&D Center, OKI Electric Industry Co., Ltd.
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Ino Masayoshi
Oki Electric Industry Co. Ltd. Vlsi Rampd Center
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Ino Masayoshi
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Tamura H
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Tamura Hitomi
Network Design Research Center Kyushu Institute Of Technology
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Tamura Hitoshi
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Yoshimaru Masaki
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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