Production of highly uniform electron cyclotron resonance plasmas by distribution control of the microwave electric field

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概要

• 論文の詳細を見る

• We have developed the apparatus that can measure the three-dimensional distribution of microwave electric field intensity in electron cyclotron resonance (ECR) plasmas to investigate production and control of ECR plasmas. The relationship between the plasma properties of ECR plasmas and the microwave electric field intensity in plasmas is studied. We have confirmed that the pattern of the radial distribution of the ion saturation current at the electrode is the same as that of the microwave electric field intensity at the ECR zone. If the distribution of microwave electric field intensity at the ECR zone is uniform, the distribution of plasma density on the electrode becomes uniform, even if the distribution of microwave electric field intensity of the other zone is not uniform. Therefore, in order to obtain the optimum distribution of plasma density on the electrode, the distribution of microwave electric field intensity at the ECR zone must be controlled.

• American Vacuum Societyの論文

著者

• Tamura H

  R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.

• Watanabe S

  Univ. Tokyo Tokyo Jpn

• Watanabe S

  R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.

• Watanabe S

  Division Of Materials Science Graduate School Of Engineering Hokkaido University

• Watanabe Seiichi

  R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.

• Tamura H

  Department Of Computer Science And Electronics Kyushu Institute Of Technology

• Tamura Hitomi

  Network Design Research Center Kyushu Institute Of Technology

• Tamura Hitoshi

  Mechanical Engineering Research Laboratory Hitachi Ltd.

• Tamura Hideki

  Faculty Of Eng. Yamagata Univ.

• WATANABE Shigeya

  Department of Engineering Physics, Faculty of Engineering, Kyoto University

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