Computational Chemistry Study on Initial Stages of Nitridation of Silicon Surfaces
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-07-30
著者
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ZHOU Hui
Department of Radiology & Public Health, Soochow University
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Miyamoto A
New Ind. Creation Hatchery Center Tohoku Univ.
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MIYAMOTO Akira
Department of Applied Chemistry, Graduate School of Engineering, Tohoku University
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Kubo Momoji
Department Of Molecular Chemistry And Engineering Tohoku University
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Kubo Momoji
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Tamura H
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Zhou Hui
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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TAMURA Hiroyuki
Department of Internal Medicine, Tokyo Medical and Dental Univeristy School of Medicine
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Takami S
Corporate Manufacturing Engineering Center Toshiba Corporation
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Zhou H
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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TAKAMI Seiichi
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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Miyamoto Akira
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Takami Seiichi
Department Of Chemical System Engineering Faculty Of Engineering The University Of Tokyo
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Tamura H
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Tamura Hitomi
Network Design Research Center Kyushu Institute Of Technology
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Tamura Hitoshi
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Tamura Hideki
Faculty Of Eng. Yamagata Univ.
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Zhou Hui
Department Of Biochemistry And National Key Laboratory Of Pharmaceutical Biotechnology Nanjing Unive
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Tamura Hiroyuki
Department Of Internal Medicine Tokyo Medical And Dental Univeristy School Of Medicine
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Tamura Hiroyuki
Department Of Applied Physics Tohoku University
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