Quantum Chemical Molecular Dynamics Simulation of the Plasma Etching Processes

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-04-30

著者

• Imamura A

  Hiroshima Kokusai Gakuin Univ.

• MIYAMOTO Akira

  Department of Applied Chemistry, Graduate School of Engineering, Tohoku University

• Kubo M

  Tohoku Univ. Sendai Jpn

• Kubo Momoji

  Department Of Molecular Chemistry And Engineering Tohoku University

• Selvam Parasuraman

  New Industry Creation Hatchery Center Tohoku University

• TAKAMI Seiichi

  Department of Materials Chemistry, Graduate School of Engineering, Tohoku University

• IMAMURA Akira

  Department of General Education, Faculty of Engineering, Hiroshima Kokusai Gakuin University

• YOKOSUKA Toshiyuki

  Department of Materials Chemistry, Graduate School of Engineering, Tohoku University

• SASATA Katsumi

  Department of Materials Chemistry, Graduate School of Engineering, Tohoku University

• KUROKAWA Hitoshi

  Department of Materials Chemistry, Graduate School of Engineering, Tohoku University

• KANOH Masaaki

  Corporate Manufacturing Engineering Center, Toshiba Corporation

• SHINMURA Tadashi

  Corporate Manufacturing Engineering Center, Toshiba Corporation

• Takami Seiichi

  Department Of Materials Chemistry Graduate School Of Engineering Tohoku University

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