SHINMURA Tadashi | Corporate Manufacturing Engineering Center, Toshiba Corporation
スポンサーリンク
概要
関連著者
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SHINMURA Tadashi
Corporate Manufacturing Engineering Center, Toshiba Corporation
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Imamura A
Hiroshima Kokusai Gakuin Univ.
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MIYAMOTO Akira
Department of Applied Chemistry, Graduate School of Engineering, Tohoku University
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Kubo M
Tohoku Univ. Sendai Jpn
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Kubo Momoji
Department Of Molecular Chemistry And Engineering Tohoku University
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Selvam Parasuraman
New Industry Creation Hatchery Center Tohoku University
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TAKAMI Seiichi
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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IMAMURA Akira
Department of General Education, Faculty of Engineering, Hiroshima Kokusai Gakuin University
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YOKOSUKA Toshiyuki
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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SASATA Katsumi
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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KUROKAWA Hitoshi
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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KANOH Masaaki
Corporate Manufacturing Engineering Center, Toshiba Corporation
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IYANAGI Katsumi
Corporate Manufacturing Engineering Center, Toshiba Corporation
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Takami Seiichi
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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Fujino Makoto
Advanced Memory Product Development Department Toshiba Corporation Semiconductor Company
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Fujino Makoto
Advanced Process Technology Group Ii Advanced Memory Product Development Memory Division Semiconduct
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Iyanagi Katsumi
Corporate Manufacturing Engineering Center Toshiba Corporation
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TAKAGI Shigeyuki
Corporate Manufacturing Engineering Center Toshiba Corporation
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Shinmura Tadashi
Corporate Manufacturing Engineering Center Toshiba Corporation
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ONOUE Seiji
Corporate Manufacturing Engineering Center, Toshiba Corporation
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Onoue Seiji
Corporate Manufacturing Engineering Center Toshiba Corporation
著作論文
- Quantum Chemical Molecular Dynamics Simulation of the Plasma Etching Processes
- Topography Simulation of Reactive Ion Etching Combined with Plasma Simulation, Sheath Model, and Surface Reaction Model(Nuclear Science, Plasmas, and Electric Discharges)