Shinmura Tadashi | Corporate Manufacturing Engineering Center Toshiba Corporation
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概要
関連著者
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Shinmura Tadashi
Corporate Manufacturing Engineering Center Toshiba Corporation
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TAKAGI Shigeyuki
Corporate Manufacturing Engineering Center Toshiba Corporation
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Ikagawa Masakuni
Corporate Manufacturing Engineering Center, Toshiba Corporation, 33 Shin-Isogo, Isogo-ku, Yokohama 235-0017, Japan
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Tohno Ichiro
Corporate Manufacturing Engineering Center, Toshiba Corporation, 33 Shin-Isogo, Isogo-ku, Yokohama 235-0017, Japan
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Kubo Momoji
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Selvam Parasuraman
New Industry Creation Hatchery Center Tohoku University
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KUROKAWA Hitoshi
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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SHINMURA Tadashi
Corporate Manufacturing Engineering Center, Toshiba Corporation
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IYANAGI Katsumi
Corporate Manufacturing Engineering Center, Toshiba Corporation
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Fujihira Masamichi
Department Of Biomolecular Engineering Tokyo Institute Of Technology
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Miyamoto Akira
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Takami Seiichi
Department Of Chemical System Engineering Faculty Of Engineering The University Of Tokyo
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Kanoh Masaaki
Corporate Manufacturing Engineering Center Toshiba Corporation
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Sasata Katsumi
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Fujino Makoto
Advanced Memory Product Development Department Toshiba Corporation Semiconductor Company
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Fujino Makoto
Advanced Process Technology Group Ii Advanced Memory Product Development Memory Division Semiconduct
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Iyanagi Katsumi
Corporate Manufacturing Engineering Center Toshiba Corporation
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Okudaira Koji
Graduated School Of Science And Technology Chiba University
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ONOUE Seiji
Corporate Manufacturing Engineering Center, Toshiba Corporation
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Kataoka Yoshinori
Corporate Manufacturing Engineering Center Toshiba Corporation
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Onoue Seiji
Corporate Manufacturing Engineering Center Toshiba Corporation
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Imamura Akira
Department Of Electronic Engineering Graduate School Of Engineering The University Of Tokyo
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Yokosuka Toshiyuki
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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Kataoka Yoshinori
SED Inc., 9-22-5 Tamura, Hiratsuka, Kanagawa 254-0013, Japan
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Ikagawa Masakuni
Corporate Manufacturing Engineering Center, Toshiba Corporation, Yokohama 235-0017, Japan
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Yokosuka Toshiyuki
Department of Materials Chemistry, Graduate School of Engineering,Tohoku University, Aoba-yama 07, Sendai 980-8579, Japan
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Miyamoto Akira
Department of Materials Chemistry, Graduate School of Engineering,Tohoku University, Aoba-yama 07, Sendai 980-8579, Japan
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Ueno Nobuo
Graduate School of Advanced Integration Science, Chiba University, Chiba 263-8522, Japan
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Kataoka Yoshinori
Corporate Manufacturing Engineering Center, Toshiba Corporation, Yokohama 235-0017, Japan
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Sugita Kazuyuki
Division of Quality Materials Science, Graduate School of Science and Technology, Chiba University, Chiba 263-8522, Japan
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Okudaira Koji
Graduate School of Advanced Integration Science, Chiba University, Chiba 263-8522, Japan
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Sasata Katsumi
Department of Materials Chemistry, Graduate School of Engineering,Tohoku University, Aoba-yama 07, Sendai 980-8579, Japan
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Kurokawa Hitoshi
Department of Materials Chemistry, Graduate School of Engineering,Tohoku University, Aoba-yama 07, Sendai 980-8579, Japan
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Kubo Momoji
Department of Materials Chemistry, Graduate School of Engineering,Tohoku University, Aoba-yama 07, Sendai 980-8579, Japan
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Takami Seiichi
Department of Materials Chemistry, Graduate School of Engineering,Tohoku University, Aoba-yama 07, Sendai 980-8579, Japan
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Shinmura Tadashi
Corporate Manufacturing Engineering Center, Toshiba Corporation, 33 Shin-Isogo-cho, Isogo-ku, Yokohama 235-0017, Japan
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Shinmura Tadashi
Corporate Manufacturing Engineering Center, Toshiba Corporation, Yokohama 235-0017, Japan
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Takagi Shigeyuki
Corporate Manufacturing Engineering Center, Toshiba Corporation, 33 Shin-Isogo, Isogo-ku, Yokohama 235-0017, Japan
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Imamura Akira
Department of Chemistry, Faculty of Science, Hiroshima University
著作論文
- Topography Simulation of Reactive Ion Etching Combined with Plasma Simulation, Sheath Model, and Surface Reaction Model(Nuclear Science, Plasmas, and Electric Discharges)
- Study on Surface Modification of Indium Tin Oxide and Resist Surfaces Using CF4/O2 Plasma for Manufacturing Organic Light-Emitting Diodes by Inkjet Printing
- Quantum Chemical Molecular Dynamics Simulation of the Plasma Etching Processes
- Selective Plasma Surface Modification of Resist for Patterning Hydrophobic and Hydrophilic Regions