Quantum Chemical Molecular Dynamics Simulation of Boron Diffusion and Si Implantation into Silicon Surface

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概要

• 論文の詳細を見る
• 2004-09-15

著者

• Miyamoto A

  New Ind. Creation Hatchery Center Tohoku Univ.

• Kubo Momoji

  Department Of Applied Chemistry Graduate School Of Engineering Tohoku University

• TSUBOI Hideyuki

  New Industry Creation Hatchery Center, Tohoku University

• Kawasaki Masashi

  Department Of Applied Biological Science Tokyo Noko University

• Tsuboi Hideyuki

  Department Of Applied Chemistry Graduate School Of Engineering Tohoku University

• Miyamoto Akira

  Department Of Applied Chemistry Graduate School Of Engineering Tohoku University

• Koyama Michihisa

  Department Of Applied Chemistry Graduate School Of Engineering Tohoku University

• Masuda Tsuyoshi

  Department Of Applied Chemistry Tohoku University

• Kumagai M

  Department Of Applied Chemistry Graduate School Of Engineering Tohoku University

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