Depth Profile Prediction on Low Energy Boron Implantation Process by Tight-Binding Quantum Chemical Molecular Dynamics
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概要
- 論文の詳細を見る
- 2004-09-15
著者
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Kumagai M
Materials And Structures Laboratory Tokyo Institute Of Technology
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Miyamoto A
New Ind. Creation Hatchery Center Tohoku Univ.
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Kawasaki M
Institute For Materials Research (imr) Tohoku University
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Kubo Momoji
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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TSUBOI Hideyuki
New Industry Creation Hatchery Center, Tohoku University
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Kawasaki Masashi
Department Of Applied Biological Science Tokyo Noko University
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Tsuboi Hideyuki
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Miyamoto Akira
New Industry Creation Hatchery Center Tohoku University:department Of Chemical Engineering Graduate
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Sasata Katsumi
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Koyama Michihisa
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Kawasaki Masashi
Riken Advanced Sci. Inst. Saitama Jpn
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YABUHARA Hidehiko
Corporate Manufacturing Engineering Center, Toshiba Corporation
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SAGAWA Ai
Department of Applied Chemistry, Graduate School of Engineering, Tohoku University
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IGA Hideki
Department of Applied Chemistry, Graduate School of Engineering, Tohoku University
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Yabuhara Hidehiko
Corporate Manufacturing Engineering Center Toshiba Corporation
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Iga Hideki
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Sagawa Ai
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Kumagai M
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Miyamoto Akira
New Industry Creation Hatchery Center (NICHe), Tohoku University, 6-6-10 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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