Effect of Surface Termination on Superlow Friction of Diamond Film: A Theoretical Study
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概要
- 論文の詳細を見る
We have applied molecular dynamics simulation and density functional theory calculations to analyze the effects of H and OH terminations on the frictional properties of diamond films at the atomistic and electronic levels. Molecular dynamics simulations were carried out for H-, OH-, and non-terminated diamond surfaces against an iron surface. Results of molecular dynamics simulations show that the frictional force is clearly decreased by the H or OH termination on the diamond surfaces. Moreover, results of density functional calculations show that a covalent bond is formed between Fe and C, while H- or OH-terminated diamond surfaces interact repulsively with an iron surface owing to antibonding interactions. We concluded that this interaction change between iron and diamond surfaces is the major contributing factor for achieving a low friction in H- or OH-terminated diamond.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-04-25
著者
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Sahnoun Riadh
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Del Carpio
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Kubo Momoji
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Takaba Hiromitsu
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Tsuboi Hideyuki
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Miyamoto Akira
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Endou Akira
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Koyama Michihisa
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Hatakeyama Nozomu
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Shibata Toshiaki
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Morita Yusuke
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Onodera Tasuku
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Onodera Tasuku
Department of Applied Chemistry, Graduate School of Engineering, Tohoku University, 6-6-11-1302 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Shibata Toshiaki
Department of Applied Chemistry, Graduate School of Engineering, Tohoku University, 6-6-11-1302 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Morita Yusuke
Department of Applied Chemistry, Graduate School of Engineering, Tohoku University, 6-6-11-1302 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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