Electrical and Crystallographic Properties of Sputtered-Pb(Zr,Ti)O_3 Films Treated by Rapid Thermal Annealing

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概要

• 論文の詳細を見る

• Pyrochlore-phase lead-zirconate-titanate (PZT) films were prepared by rf-magnetron sputtering using a multielement metal target at 400℃. These films were crystallized to the perovskite phase by rapid thermal annealing (RTA) at 600℃ for a few minutes. The RTA-treated PZT films had not only extremely smooth surfaces but also tenfold stronger X-ray diffraction peak intensities of the perovskite structure than those of furnace-annealed films which had with rough undulation. The electrical properties of RTA-treated films indicated good ferroelectric properties. The remanent polarization and coercive field of the 100 nm-thick RTA-treated film were 15 μC/cm^2 and 67kV/am, respectively. Fatigue measurements with alternating ±3 V pulses showed that the film was stable up to 10^9 cycles.

• 社団法人応用物理学会の論文
• 1993-09-30

著者

• Tamura H

  R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.

• TAMURA Hiroyuki

  VLSI R&D Center, Oki Electric Industry Co. Ltd.

• YOSHIMARU Masaki

  VLSI R&D Center, OKI Electric Industry Co., Ltd.

• INO Masayoshi

  VLSI R&D Center, OKI Electric Industry Co., Ltd.

• Ino Masayoshi

  Oki Electric Industry Co. Ltd. Vlsi Rampd Center

• Ino Masayoshi

  Vlsi R&ampd Center Oki Electric Industry Co. Ltd.

• Tamura H

  Department Of Computer Science And Electronics Kyushu Institute Of Technology

• Tamura Hitomi

  Network Design Research Center Kyushu Institute Of Technology

• Tamura Hitoshi

  Mechanical Engineering Research Laboratory Hitachi Ltd.

• YAMAUCHI Satoshi

  VLSI R&D Center, Oki Electric Industry Co., Ltd.

• Yamauchi S

  Faculty Of Agriculture Ehime University

• Yamauchi Satoshi

  Laboratory Of Pesticide Chemistry Faculty Of Agriculture Kyushu University

• Yoshimaru Masaki

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• Yamauchi Satoshi

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

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