YOSHIMARU Masaki | VLSI R&D Center, OKI Electric Industry Co., Ltd.
スポンサーリンク
概要
関連著者
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YOSHIMARU Masaki
VLSI R&D Center, OKI Electric Industry Co., Ltd.
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Yoshimaru Masaki
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Chen Shih-chang
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Tamura H
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Inoue N
National Defense Acad. Yokosuka Jpn
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Inoue N
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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TAMURA Hiroyuki
VLSI R&D Center, Oki Electric Industry Co. Ltd.
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Chen S‐c
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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INO Masayoshi
VLSI R&D Center, OKI Electric Industry Co., Ltd.
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Ino Masayoshi
Oki Electric Industry Co. Ltd. Vlsi Rampd Center
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Ino Masayoshi
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Tamura H
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Tamura Hitomi
Network Design Research Center Kyushu Institute Of Technology
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Tamura Hitoshi
Mechanical Engineering Research Laboratory Hitachi Ltd.
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KISHIRO Koichi
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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INOUE Nobuhiko
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Kishiro Koichi
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Chen S‐c
National Taiwan Normal Univ. Taipei Twn
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Sakamoto Akihiro
Process Technology Center Oki Electric Industry Co. Ltd.
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YAMAUCHI Satoshi
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Yamauchi S
Faculty Of Agriculture Ehime University
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Yamauchi Satoshi
Laboratory Of Pesticide Chemistry Faculty Of Agriculture Kyushu University
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Yamauchi Satoshi
Vlsi R&d Center Oki Electric Industry Co. Ltd.
著作論文
- Applicability of TiN Adhesion Layer Formed by Nitridation of Sputtered Ti Film to Blanket CVD-W Contact Filling
- Electrical and Crystallographic Properties of Sputtered-Pb(Zr,Ti)O_3 Films Treated by Rapid Thermal Annealing
- Structure and Electrical Properties of Thin Ta_2O_5 Deposited on Metal Electrodes
- Properties of Highly Oriented Ta_2O_5 on Metal Electrodes