Kishiro Koichi | Vlsi R&d Center Oki Electric Industry Co. Ltd.

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概要

• KISHIRO Koichiの詳細を見る
• 同名の論文著者
• Vlsi R&d Center Oki Electric Industry Co. Ltd.の論文著者

関連著者

• Kishiro Koichi

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• HIRAKAWA Kazuyoshi

  Department of Electronics,Kyushu University

• KURIYAKI Hisao

  Department of Electronics, Faculty of Engineering, Kyushu University

• Hirakawa Kazuyoshi

  Department Of Electromics Kyusyu University

• Kuriyaki H

  Kyushu Univ. Fukuoka Jpn

• Kuriyaki Hisao

  Department Of Electronics Faculty Of Engineering

• KISHIRO Koichi

  Department of Electronics, Faculty of Engineering, Kyushu University

• Hirakawa K

  Department Of Electronics Kyushu University

• Hirakawa Kazuyoshi

  Department Of Elctronics Engineering Kyushu University

• Chen Shih-chang

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• Inoue N

  National Defense Acad. Yokosuka Jpn

• Inoue N

  Oki Electric Ind. Co. Ltd. Tokyo Jpn

• Chen S‐c

  Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company

• YOSHIMARU Masaki

  VLSI R&D Center, OKI Electric Industry Co., Ltd.

• KISHIRO Koichi

  VLSI R&D Center, Oki Electric Industry Co., Ltd.

• INOUE Nobuhiko

  VLSI R&D Center, Oki Electric Industry Co., Ltd.

• Yoshimaru Masaki

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• TAKEMOTO Satoshi

  Department of Electronics, Faculty of Engineering, Kyushu University

• Takemoto Satoshi

  Department Of Electronics Faculty Of Engineering Kyushu University

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著作論文

• Structure and Electrical Properties of Thin Ta_2O_5 Deposited on Metal Electrodes
• Properties of Highly Oriented Ta_2O_5 on Metal Electrodes
• Resistivity Response to Oxygen of Transition Metal Dichalcogenide TiS_2
• Grain Size Effect of CuFeTe_2 Response to Oxygen
• Oxygen Gas Response of Layered Compound CuFeTe_2

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