Observation of Al surface during sputter-cleaning and annealing procedures under UHV-REM

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概要

• 論文の詳細を見る
• Published for the Japanese Society of Electron Microscopy by Oxford University Pressの論文
• 1998-06-01

著者

• 高井 義造

  Department Of Material And Life Science Graduate School Of Engineering Osaka University

• Takai Yoshiaki

  Nagoya University

• SHIMIZU Ryuichi

  Department of Applied Physics, Osaka University

• 木村 吉秀

  阪大院・工

• KIMURA Yoshihide

  Department of Applied Physics, Osaka University

• TAKAI Yoshizo

  Department of Material and Life Sciences, Graduate School of Engineering, Osaka University

• NAGATOMI Takaharu

  Department of Material and Life Science, Graduate School of Engineering, Osaka University

• AKITA Tomoki

  Department of Applied Physics, Faculty of Engineering Osaka University

• NAGATA Takanori

  Department of Applied Physics, Faculty of Engineering Osaka University

• 木村 吉秀

  大阪大 大学院工学研究科

• Akita Tomoki

  Special Division For Green Life Technology National Institute Of Advanced Industrial Science And Tec

• Akita Tomoki

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Souda R

  National Institute For Research In Inorganic Materials

• Takai Yoshizo

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Shimizu R

  Department Of Information Science Osaka Institute Of Technology

• Shimizu R

  Osaka Univ. Osaka Jpn

• Shimizu Ryuichi

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Kimura Yoshihide

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Nagatomi T

  Department Of Material And Life Science Graduate School Of Engineering Osaka University

• Shimizu Ryuichi

  Department Of Applied Physics Faculty Engineering Osaka University

• Shimizu Ryuichi

  Department of Information Processing, Osaka Institute of Technology

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