Application of the Focused-Ion-Beam Technique for Preparing the Cross-Sectional Sample of Chemical Vapor Deposition Diamond Thin Film for High-Resolution Transmission Electron Microscope Observation
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概要
- 論文の詳細を見る
Atomic-scale observation of chemical vapor deposition (CVD)-diamond/silicon interface structures was successfully performed by applying a focused-ion-beam (FIB) technique for preparing the cross-sectional samples. Several severe conditions such as weak adhesion and extreme difference in sputtering yield have virtually prevented the proper processing of the interface cross sections by only the conventional method. A sample preparation procedure is proposed with some specific devices for extreme thinning, sufficient for high-resolution transmission electron microscope (HRTEM) observation, emphasizing the good potential for wider practical use.
- 社団法人応用物理学会の論文
- 1992-09-01
著者
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Takai Yoshiaki
Nagoya University
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TARUTANI Masayoshi
Department of Applied Physics, Faculty of Engineering, Osaka University
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Souda R
National Institute For Research In Inorganic Materials
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Takai Yoshizo
Department Of Applied Physics Faculty Of Engineering Osaka University
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Shimizu R
Department Of Information Science Osaka Institute Of Technology
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Shimizu R
Osaka Univ. Osaka Jpn
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Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
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Tarutani Masayoshi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
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Shimizu Ryuichi
Department of Information Processing, Osaka Institute of Technology
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